USD1108379SActiveUtility

Electrode cover for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Sep 29, 2023Filed: Mar 28, 2024Granted: Jan 6, 2026
Est. expirySep 29, 2043(~17.2 yrs left)· nominal 20-yr term from priority
Inventors:HIROZANE KAZUYUKISHIRAKI TOMOHIRO
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PatentIndex Score
0
Cited by
37
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing apparatus as shown and described.

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