USD1109711SActiveUtility

Gas nozzle for a substrate processing apparatus

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Assignee: KOKUSAI ELECTRIC CORPPriority: Mar 8, 2024Filed: Sep 5, 2024Granted: Jan 20, 2026
Est. expiryMar 8, 2044(~17.6 yrs left)· nominal 20-yr term from priority
Inventors:MORIYA TAKETOSHIOKAJIMA YUSAKUURUSHIHARA Mika
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PatentIndex Score
0
Cited by
35
References
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Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.

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