USD556704SExpiredUtility

Grounded electrode for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Aug 25, 2005Filed: Aug 25, 2005Granted: Dec 4, 2007
Est. expiryAug 25, 2025(expired)· nominal 20-yr term from priority
Inventors:Tsutomu NakamuraSusumu TauchiAkitaka Makino
99
PatentIndex Score
445
Cited by
14
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for grounded electrode for a plasma processing apparatus, as shown.

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