USD557425SExpiredUtility

Cover ring for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Aug 25, 2005Filed: Aug 25, 2005Granted: Dec 11, 2007
Est. expiryAug 25, 2025(expired)· nominal 20-yr term from priority
84
PatentIndex Score
31
Cited by
13
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for cover ring for a plasma processing apparatus, as shown.

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