USD582949SActiveUtility

Cover for a heater stage of a plasma processing apparatus

84
Assignee: TOKYO ELECTRON LTDPriority: Dec 15, 2006Filed: Jun 14, 2007Granted: Dec 16, 2008
Est. expiryDec 15, 2026(~0.4 yrs left)· nominal 20-yr term from priority
Inventors:Jun Yamashita
84
PatentIndex Score
31
Cited by
22
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown.

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