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Plasma inducing plate for semiconductor deposition apparatus

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Assignee: ASM GENITECH KOREA LTDPriority: Jan 16, 2009Filed: Jan 16, 2009Granted: Dec 29, 2009
Est. expiryJan 16, 2029(~2.5 yrs left)· nominal 20-yr term from priority
Inventors:Jeong Ho LeeSang Jin JeongWoo Chan Kim
99
PatentIndex Score
534
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11
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1
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Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a plasma inducing plate for semiconductor deposition apparatus, as shown and described.

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