Assignee
ASM GENITECH KOREA LTD
KR·12 granted patents·9 pending applications·1,914 citations·filing 2001–2016
Top patents by PatentIndex Score
21 records- 0199USD606952SPlasma inducing plate for semiconductor deposition apparatusASM GENITECH KOREA LTD·Filed 2009·Granted Dec 29, 2009·534 cites·1 claims
- 0298USD614593SSubstrate support for a semiconductor deposition apparatusASM GENITECH KOREA LTD·Filed 2009·Granted Apr 27, 2010·614 cites·1 claims
- 0397USRE47170EMethod of forming semiconductor patternsASM GENITECH KOREA LTD·Filed 2013·Granted Dec 18, 2018·441 cites·72 claims
- 0495US7141278B2Thin film forming methodASM GENITECH KOREA LTD·Filed 2001·Granted Nov 28, 2006·122 cites·10 claims
- 0593US7138336B2Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereofASM GENITECH KOREA LTD·Filed 2001·Granted Nov 21, 2006·139 cites·46 claims
- 0691US7485349B2Thin film forming methodASM GENITECH KOREA LTD·Filed 2006·Granted Feb 3, 2009·17 cites·39 claims
- 0790US7976898B2Atomic layer deposition apparatusASM GENITECH KOREA LTD·Filed 2007·Granted Jul 12, 2011·16 cites·9 claims
- 0888US7541284B2Method of depositing Ru films having high densityASM GENITECH KOREA LTD·Filed 2007·Granted Jun 2, 2009·24 cites·32 claims
- 0966US8347813B2Thin film deposition apparatus and method thereofASM GENITECH KOREA LTD·Filed 2008·Granted Jan 8, 2013·2 cites·16 claims
- 1062US9963783B2Plasma processing member, deposition apparatus including the same, and depositing method using the sameASM GENITECH KOREA LTD·Filed 2016·Granted May 8, 2018·0 cites·21 claims
- 1161US9879342B2Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the sameASM GENITECH KOREA LTD·Filed 2015·Granted Jan 30, 2018·0 cites·10 claims
- 1257US2009047426A1Deposition apparatusASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 1357US2009155606A1Methods of depositing a silicon nitride filmASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 1456US2009041952A1Method of depositing silicon oxide filmsASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 1547US2010275844A1Deposition apparatusASM GENITECH KOREA LTD·Filed 2010·Application pending·0 cites
- 1647US2008241384A1Lateral flow deposition apparatus and method of depositing film by using the apparatusASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 1746US2009163024A1Methods of depositing a ruthenium filmASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 1846US2008110399A1Atomic layer deposition apparatusASM GENITECH KOREA LTD·Filed 2007·Application pending·0 cites
- 1945USD614152SSubstrate transfer device for semiconductor deposition apparatusASM GENITECH KOREA LTD·Filed 2009·Granted Apr 20, 2010·5 cites·1 claims
- 2045US2008171436A1Methods of depositing a ruthenium filmASM GENITECH KOREA LTD·Filed 2008·Application pending·0 cites
- 2143US2008075858A1Ald apparatus and method for depositing multiple layers using the sameASM GENITECH KOREA LTD·Filed 2007·Application pending·0 cites
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