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Dielectric window for plasma processing device

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Assignee: TOKYO ELECTRON LTDPriority: Mar 31, 2010Filed: Sep 10, 2010Granted: Sep 20, 2011
Est. expiryMar 31, 2030(~3.7 yrs left)· nominal 20-yr term from priority
Inventors:Wataru YoshikawaNaoki MatsumotoJun Yoshikawa
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PatentIndex Score
6
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1
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Claims

exact text as granted — not AI-modified
The ornamental design for a dielectric window for a plasma processing device, as shown and described.

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