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Gas-separating plate for reactor for manufacturing semiconductor

98
Assignee: HONMA MANABUPriority: Oct 21, 2010Filed: Apr 13, 2011Granted: Mar 6, 2012
Est. expiryOct 21, 2030(~4.3 yrs left)· nominal 20-yr term from priority
Inventors:Manabu HonmaKatsuyuki Hishiya
98
PatentIndex Score
421
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12
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1
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Claims

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CLAIM 
     
       The ornamental design for gas-separating plate for reactor for manufacturing semiconductor, as shown and described.

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