Inventor · disambiguated record
Manabu Honma
Also filed as: HONMA MANABU
55 granted patents·36 pending applications·3,066 citations·filing 1997–2025
99Inventor score
Top patents by PatentIndex Score
91 records- 0199US9267204B2Film deposition apparatus, substrate processing apparatus, film deposition method, and storage mediumHONMA MANABU·Filed 2009·Granted Feb 23, 2016·426 cites·15 claims
- 0298USD655260SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·421 cites·1 claims
- 0398USD655261SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·421 cites·1 claims
- 0498USD654882SGas-separating plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·421 cites·1 claims
- 0598USD654884STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·525 cites·1 claims
- 0698US6235121B1Vertical thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 22, 2001·339 cites·11 claims
- 0797US8465592B2Film deposition apparatusKATO HITOSHI·Filed 2011·Granted Jun 18, 2013·22 cites·14 claims
- 0896US10221480B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Mar 5, 2019·19 cites·5 claims
- 0996US8721790B2Film deposition apparatusKATO HITOSHI·Filed 2010·Granted May 13, 2014·23 cites·16 claims
- 1095US9988717B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·6 cites·7 claims
- 1195US8465591B2Film deposition apparatusKATO HITOSHI·Filed 2009·Granted Jun 18, 2013·22 cites·10 claims
- 1294US9103030B2Film deposition apparatusKATO HITOSHI·Filed 2009·Granted Aug 11, 2015·21 cites·12 claims
- 1394US8882915B2Film deposition apparatus, film deposition method, and computer readable storage mediumKATO HITOSHI·Filed 2010·Granted Nov 11, 2014·19 cites·6 claims
- 1493US8992685B2Substrate processing apparatus, substrate processing method, and computer-readable storage mediumKATO HITOSHI·Filed 2010·Granted Mar 31, 2015·18 cites·15 claims
- 1592US8808456B2Film deposition apparatus and substrate process apparatusKATO HITOSHI·Filed 2009·Granted Aug 19, 2014·20 cites·25 claims
- 1692US8673395B2Film deposition apparatus, film deposition method, and storage mediumTOKYO ELECTRON LTD·Filed 2013·Granted Mar 18, 2014·10 cites·8 claims
- 1792US8372202B2Film deposition apparatusTOKYO ELECTRON LTD·Filed 2009·Granted Feb 12, 2013·17 cites·8 claims
- 1892US8034723B2Film deposition apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2010·Granted Oct 11, 2011·19 cites·11 claims
- 1990US8518183B2Film deposition apparatus, substrate process apparatus, film deposition method, and computer readable storage mediumHONMA MANABU·Filed 2009·Granted Aug 27, 2013·11 cites·14 claims
- 2089US8961691B2Film deposition apparatus, film deposition method, computer readable storage medium for storing a program causing the apparatus to perform the methodKATO HITOSHI·Filed 2009·Granted Feb 24, 2015·11 cites·6 claims
- 2188US8845857B2Substrate processing apparatusOHIZUMI YUKIO·Filed 2010·Granted Sep 30, 2014·17 cites·8 claims
- 2287US9039837B2Film deposition apparatus and substrate processing apparatusHONMA MANABU·Filed 2012·Granted May 26, 2015·3 cites·7 claims
- 2387US8854449B2Substrate position detection apparatus, film deposition apparatus equipped with the same, and substrate position detection methodAIKAWA KATSUYOSHI·Filed 2011·Granted Oct 7, 2014·14 cites·10 claims
- 2486US8746170B2Substrate process apparatus, substrate process method, and computer readable storage mediumORITO KOHICHI·Filed 2010·Granted Jun 10, 2014·14 cites·6 claims
- 2585US8840727B2Film deposition apparatus, substrate processor, film deposition method, and computer-readable storage mediumKATO HITOSHI·Filed 2009·Granted Sep 23, 2014·10 cites·9 claims
- 2683US8673079B2Film deposition apparatus and substrate processing apparatusKATO HITOSHI·Filed 2009·Granted Mar 18, 2014·11 cites·18 claims
- 2781USD654883STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Feb 28, 2012·28 cites·1 claims
- 2879USD404015SWafer boat for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted Jan 12, 1999·22 cites·1 claims
- 2977US9093490B2Film deposition apparatusKATO HITOSHI·Filed 2010·Granted Jul 28, 2015·4 cites·10 claims
- 3077USD655259STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·22 cites·1 claims
- 3177USD655257STop plate for reactor for manufacturing semiconductorHONMA MANABU·Filed 2011·Granted Mar 6, 2012·23 cites·1 claims
- 3276US5981966AAuto-teaching method in semiconductor processing systemTOKYO ELECTRON LTD·Filed 1998·Granted Nov 9, 1999·49 cites·20 claims
- 3375US9683290B2Substrate processing apparatus having a pillar support structure for preventing transformation of a ceiling portionTOKYO ELECTRON LTD·Filed 2016·Granted Jun 20, 2017·2 cites·6 claims
- 3474US8944077B2Film deposition apparatus, cleaning method for the same, and computer storage medium storing programKATO HITOSHI·Filed 2009·Granted Feb 3, 2015·4 cites·7 claims
- 3574US7432475B2Vertical heat treatment device and method controlling the sameTOKYO ELECTRON LTD·Filed 2004·Granted Oct 7, 2008·17 cites·12 claims
- 3671US9297072B2Film deposition apparatusKATO HITOSHI·Filed 2009·Granted Mar 29, 2016·3 cites·23 claims
- 3768US2024209508A1Deposition apparatus and processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3867US10584416B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 10, 2020·1 cites·9 claims
- 3966US12359302B2Film deposition apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2023·Granted Jul 15, 2025·0 cites·13 claims
- 4066US2024209507A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4166US2013251904A1Film deposition method and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 4264US12091753B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Granted Sep 17, 2024·0 cites·13 claims
- 4364US2025167040A1Lifting mechanism and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4464US2025167018A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4563US12385136B2Apparatus for performing film forming process on substrate, and method of exhausting processing gas from apparatus for performing film forming process on substrateTOKYO ELECTRON LTD·Filed 2022·Granted Aug 12, 2025·0 cites·8 claims
- 4662US7674336B2Processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 9, 2010·11 cites·5 claims
- 4762US2024295027A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4862US2024395585A1Substrate processing apparatus and substrate transfer methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4962US2025372429A1Lifting mechanism, substrate processing apparatus and lifting methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 5061US9416448B2Film deposition apparatus, substrate processing apparatus, film deposition method, and computer-readable storage medium for film deposition methodKATO HITOSHI·Filed 2009·Granted Aug 16, 2016·1 cites·27 claims
Showing the top 50 of 91 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →