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Side wall for reactor for manufacturing semiconductor

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Assignee: HONMA MANABUPriority: Oct 21, 2010Filed: Apr 13, 2011Granted: Mar 6, 2012
Est. expiryOct 21, 2030(~4.3 yrs left)· nominal 20-yr term from priority
Inventors:Manabu HonmaKatsuyuki Hishiya
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PatentIndex Score
8
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14
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1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.

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