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Electrode plate for plasma processing apparatus

97
Assignee: TOKYO ELECTRON LTDPriority: Jun 10, 2015Filed: Dec 1, 2015Granted: Aug 1, 2017
Est. expiryJun 10, 2035(~8.9 yrs left)· nominal 20-yr term from priority
Inventors:Shinichi KozukaRyosuke NiitsumaManabu Ishikawa
97
PatentIndex Score
501
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19
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1
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Claims

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CLAIM 
     
       The ornamental design for an electrode plate for plasma processing apparatus, as shown and described.

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