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Upper chamber for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Jun 12, 2015Filed: Oct 30, 2015Granted: Dec 5, 2017
Est. expiryJun 12, 2035(~8.9 yrs left)· nominal 20-yr term from priority
Inventors:Susumu TauchiTakashi UemuraKohei Sato
90
PatentIndex Score
37
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CLAIM 
     
       The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.

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