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Heat reflector for substrate processing apparatus

91
Assignee: HITACHI INT ELECTRIC INCPriority: Jun 16, 2015Filed: Dec 15, 2015Granted: Dec 5, 2017
Est. expiryJun 16, 2035(~8.9 yrs left)· nominal 20-yr term from priority
Inventors:Koichiro HaradaTakeshi Yasui
91
PatentIndex Score
42
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19
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1
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Claims

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CLAIM 
     
       We claim the ornamental design for a heat reflector for substrate processing apparatus, as shown (and described).

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