USD812578SActiveUtility

Upper chamber for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Feb 26, 2016Filed: Jul 26, 2016Granted: Mar 13, 2018

Est. expiryFeb 26, 2036(~9.6 yrs left)· nominal 20-yr term from priority

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Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.

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