USD868995SActiveUtility

Gas diffusion plate for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Nov 6, 2017Filed: Feb 27, 2018Granted: Dec 3, 2019

Est. expiryNov 6, 2037(~11.3 yrs left)· nominal 20-yr term from priority

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Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for a gas diffusion plate for a plasma processing apparatus, as shown and described.

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