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Gas ring for a plasma processing apparatus

74
Assignee: HITACHI HIGH TECH CORPPriority: Jul 31, 2017Filed: Jan 30, 2018Granted: Dec 31, 2019
Est. expiryJul 31, 2037(~11 yrs left)· nominal 20-yr term from priority
Inventors:Kouji OkudaMotohiro Tanaka
74
PatentIndex Score
15
Cited by
30
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a gas ring for a plasma processing apparatus, as shown and described.

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