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Discharge chamber for a plasma processing apparatus

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Assignee: HITACHI HIGH TECH CORPPriority: Jan 20, 2017Filed: Jul 18, 2017Granted: Jan 12, 2021
Est. expiryJan 20, 2037(~10.5 yrs left)· nominal 20-yr term from priority
Inventors:Nobuhide NunomuraKeitarou Ogawa
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PatentIndex Score
9
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26
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1
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Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a discharge chamber for a plasma processing apparatus, as shown and described.

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