USD908645SActiveUtility

Sputtering target for a physical vapor deposition chamber

88
Assignee: APPLIED MATERIALS INCPriority: Aug 26, 2019Filed: Aug 26, 2019Granted: Jan 26, 2021
Est. expiryAug 26, 2039(~13.1 yrs left)· nominal 20-yr term from priority
Inventors:Kirankumar Neelasandra SavandaiahDavid GuntherSiew Kit Hoi
88
PatentIndex Score
29
Cited by
122
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for a sputtering target for a physical vapor deposition chamber, as shown and described.

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