USD954986SActiveUtility

Electrode cover for a plasma processing device

83
Assignee: HITACHI HIGH TECH CORPPriority: Oct 18, 2019Filed: Apr 16, 2020Granted: Jun 14, 2022
Est. expiryOct 18, 2039(~13.2 yrs left)· nominal 20-yr term from priority
Inventors:Shintarou Nakatani
83
PatentIndex Score
10
Cited by
20
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an electrode cover for a plasma processing device, as shown and described.

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