USD958401SActiveUtility

Ion shield plate for plasma processing device

65
Assignee: HITACHI HIGH TECH CORPPriority: May 27, 2020Filed: Nov 25, 2020Granted: Jul 19, 2022
Est. expiryMay 27, 2040(~13.9 yrs left)· nominal 20-yr term from priority
Inventors:Kazuumi Tanaka
65
PatentIndex Score
4
Cited by
17
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an ion shield plate for plasma processing apparatus, as shown and described.

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