Temperature sensing probe, burl plate, lithographic apparatus and method

Abstract

A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.

The invention claimed is: 
     
       1. A burl plate for a lithographic apparatus, the burl plate comprising:
 a main body comprising an object supporting surface; and 
 a temperature sensing probe comprising a temperature sensor in an elongate housing, wherein the elongate housing is elongate in a first direction transverse to the object supporting surface, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. in at least one direction, wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing. 
 
     
     
       2. The burl plate of  claim 1 , wherein the sensor is inserted in a hole in the main body to measure an average temperature of the a surface of the hole. 
     
     
       3. The burl plate of  claim 2 , wherein the main body comprises two parts and the hole is elongate in a substantially perpendicular direction to a plane in which the two parts of the main body are joined. 
     
     
       4. The burl plate of  claim 3 , wherein the a distance the hole extends through a first part of the two parts is substantially equal to the a distance the hole extends through a second part of the two parts. 
     
     
       5. The burl plate of  claim 2 , wherein the hole is a blind hole. 
     
     
       6. The burl plate of  claim 1 , further comprising a heater on a surface of the main body opposite to a surface on which a substrate is to be positioned, in use. 
     
     
       7. The burl plate of  claim 6 , comprising at least one further heater on the surface. 
     
     
       8. The burl plate of  claim 7 , comprising a further temperature sensing probe having a temperature sensor in an elongate housing wherein the elongate housing is elongate and comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C., each of the heaters having an associated temperature sensing probe. 
     
     
       9. A burl plate comprising:
 a main body comprising a substrate supporting surface; 
 a heater on a surface of the main body opposite the substrate supporting surface; and 
 a temperature sensing probe comprising a housing elongate in a direction transverse to the substrate supporting surface and/or the surface opposite the substrate supporting surface and comprising a temperature sensor, in the housing, configured to measure an average temperature averaged over a distance in the direction of a part of the main body between the substrate supporting surface and the surface opposite the substrate supporting surface. 
 
     
     
       10. The burl plate of  claim 9 , wherein the elongated housing is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. 
     
     
       11. A lithographic apparatus comprising:
 a system to impart a pattern on a substrate; 
 a burl plate comprising a main body, the main body comprising an object supporting surface; and 
 a temperature sensing probe, comprising a temperature sensor in an elongate housing, wherein the elongate housing is elongate in a first direction transverse to the object supporting surface, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C. in at least one direction, wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing. 
 
     
     
       12. A method of compensating for a local heat load in an immersion lithographic projection apparatus, the method comprising:
 measuring an average temperature of a part of a main body of a burl plate between a substrate supporting surface of the main body and a surface opposite the substrate supporting surface, using a temperature sensing probe comprising a housing elongate in a direction transverse to the substrate supporting surface and/or the surface opposite the substrate supporting surface and comprising a temperature sensor in the housing, wherein the average temperature is averaged over a distance in the direction of the part; and 
 controlling a heater on the surface of the main body opposite the substrate supporting surface based on a signal indicative of the average temperature. 
 
     
     
       13. The burl plate of  claim 9 , wherein the sensor is inserted in a hole in the main body to measure an average temperature of the a surface of the hole. 
     
     
       14. The lithographic apparatus of  claim 11 , wherein the sensor is inserted in a hole in the main body to measure an average temperature of the a surface of the hole. 
     
     
       15. A burl plate system for a lithographic apparatus, the burl plate system comprising:
 a main body; and 
 a temperature sensing probe comprising a temperature sensor in a housing, wherein the housing is elongate, contacts the main body along at least part of its length, and is comprised of a material with a thermal conductivity of at least 100 W/mK at 20° C., and wherein the temperature sensor is shorter than the length of the elongate housing and wherein the at least part of the elongate housing in contact with the main body extends in lengths from opposite sides of the position of the sensor in the elongate housing. 
 
     
     
       16. The burl plate system of  claim 15 , wherein the sensor is inserted in a hole in the main body to measure an average temperature of the a surface of the hole. 
     
     
       17. The burl plate system of  claim 16 , wherein the hole is a blind hole. 
     
     
       18. The burl plate system of  claim 15 , wherein the housing is elongate in a direction transverse to an object supporting surface of the main body and/or a surface of the main body opposite the object supporting surface. 
     
     
       19. The burl plate system of  claim 15 , wherein the temperature sensor is substantially at a center of the elongate housing. 
     
     
       20. The burl plate system of  claim 15 , further comprising a system of a lithographic apparatus to impart a pattern on a substrate. 
     
     
       21. A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
 a main body;   a first plurality of protrusions protruding from the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;   a second plurality of protrusions protruding from the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body, the second plurality of protrusions having a different pitch than the first plurality of protrusions and at least a portion of the main body is located over each of the second plurality of protrusions;   a heat transfer channel located between the first and second surfaces, the heat transfer channel arranged to allow active transfer of heat with at least the main body; and   a temperature determining arrangement.   
     
     
       22. The support structure arrangement of claim 21, wherein, in a horizontal direction, at least one protrusion of the first plurality of protrusions is located between two adjacent protrusions of the second plurality of protrusions. 
     
     
       23. The support structure arrangement of claim 22, wherein, in the horizontal direction, at least two protrusions of the first plurality of protrusions are located between two adjacent protrusions of the second plurality of protrusions. 
     
     
       24. The support structure arrangement of claim 21, wherein a vertical center line of a protrusion of the first plurality of protrusions does not intersect any of the protrusions of the second plurality of protrusions. 
     
     
       25. The support structure arrangement of claim 21, wherein a protrusion of the first and/or second plurality of protrusions has a base nearer the main body that is wider than a protruding end. 
     
     
       26. The support structure arrangement of claim 21, wherein the main body comprises SiSiC. 
     
     
       27. A lithographic apparatus comprising a system to impart a pattern on a substrate, and the support structure arrangement of claim 21 configured to support the substrate as the object. 
     
     
       28. A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
 a main body;   a first plurality of protrusions protruding from the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;   a second plurality of protrusions protruding from the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body, wherein, in a horizontal direction, at least one protrusion of the first plurality of protrusions is located between two adjacent protrusions of the second plurality of protrusions and at least a portion of the main body is located over each of the second plurality of protrusions;   a heater on an external surface of the main body, the heater located at the second side; and   a temperature determining device.   
     
     
       29. The support structure arrangement of claim 28, wherein, in the horizontal direction, at least two protrusions of the first plurality of protrusions are located between two adjacent protrusions of the second plurality of protrusions. 
     
     
       30. The support structure arrangement of claim 28, wherein the second plurality of protrusions has a different spacing among its protrusions than a spacing among the protrusions of the first plurality of protrusions. 
     
     
       31. The support structure arrangement of claim 28, wherein a protrusion of the first and/or second plurality of protrusions has a base nearer the main body that is wider than a protruding end. 
     
     
       32. The support structure arrangement of claim 28, wherein the main body comprises SiSiC. 
     
     
       33. A lithographic apparatus comprising a system to impart a pattern on a substrate, and the support structure arrangement of claim 28 configured to support the substrate as the object. 
     
     
       34. The support structure arrangement of claim 28, further comprising a heat transfer channel located between the first and second surfaces, the heat transfer channel arranged to allow active transfer of heat with at least the main body. 
     
     
       35. The support structure arrangement of claim 28, further comprising a blind hole that opens to the environment at the second side. 
     
     
       36. The support structure arrangement of claim 21, further comprising a heater on an external surface of the main body, the heater located at the second side. 
     
     
       37. The support structure arrangement of claim 21, further comprising a blind hole that opens to the environment at the second side. 
     
     
       38. A support structure arrangement for a lithographic apparatus, the support structure arrangement comprising:
 a main body;   a first plurality of protrusions protruding from a first surface of the main body and arranged on a first side of the main body, the ends of the first plurality of protrusions arranged to provide a support surface for a removable object and at least a portion of the main body is located underneath each of first plurality of protrusions;   a second plurality of protrusions protruding from a second surface of the main body and arranged on a second side of the main body opposite to the first side, the ends of the second plurality of protrusions arranged to provide a surface to engage with a surface of a table configured to support the main body;   a heat transfer channel located between the first and second surfaces, the heat transfer channel arranged to allow active transfer of heat with at least the main body, and   a heater on an external surface of the main body, the heater located at the second side; and   a temperature determining device.   
     
     
       39. The support structure arrangement of claim 38, wherein the main body comprises SiSiC and wherein, in a horizontal direction, at least one protrusion of the first plurality of protrusions is located between two adjacent protrusions of the second plurality of protrusions and at least a portion of the main body is located over each of the second plurality of protrusions.