Assignee
IIZUKA HACHISHIRO
JP·13 granted patents·3 pending applications·632 citations·filing 2005–2011
Top patents by PatentIndex Score
16 records- 0198US8282769B2Shower head and plasma processing apparatus having sameIIZUKA HACHISHIRO·Filed 2010·Granted Oct 9, 2012·549 cites·13 claims
- 0295US8152925B2Baffle plate and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2009·Granted Apr 10, 2012·36 cites·17 claims
- 0388US8236106B2Shower head and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2009·Granted Aug 7, 2012·21 cites·20 claims
- 0483US8852387B2Plasma processing apparatus and shower headIIZUKA HACHISHIRO·Filed 2011·Granted Oct 7, 2014·6 cites·8 claims
- 0578US8852386B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2010·Granted Oct 7, 2014·5 cites·5 claims
- 0675US8747609B2Plasma processing apparatus and shower headIIZUKA HACHISHIRO·Filed 2010·Granted Jun 10, 2014·4 cites·8 claims
- 0775US8674607B2Plasma processing apparatus and processing gas supply structure thereofIIZUKA HACHISHIRO·Filed 2011·Granted Mar 18, 2014·3 cites·7 claims
- 0874US8758550B2Shower head and plasma processing apparatus having sameIIZUKA HACHISHIRO·Filed 2010·Granted Jun 24, 2014·3 cites·9 claims
- 0971US8758511B2Film forming apparatus and vaporizerIIZUKA HACHISHIRO·Filed 2005·Granted Jun 24, 2014·2 cites·25 claims
- 1067US8986495B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2010·Granted Mar 24, 2015·2 cites·5 claims
- 1158US9117633B2Plasma processing apparatus and processing gas supply structure thereofIIZUKA HACHISHIRO·Filed 2011·Granted Aug 25, 2015·1 cites·13 claims
- 1252US8221581B2Gas supply mechanism and substrate processing apparatusIIZUKA HACHISHIRO·Filed 2008·Granted Jul 17, 2012·0 cites·20 claims
- 1342US9196461B2Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Granted Nov 24, 2015·0 cites·9 claims
- 1441US2012103523A1Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Application pending·0 cites
- 1540US2007095284A1Gas treating device and film forming deviceIIZUKA HACHISHIRO·Filed 2006·Application pending·0 cites
- 1638US2011284165A1Plasma processing apparatusIIZUKA HACHISHIRO·Filed 2011·Application pending·0 cites
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