Assignee
LPE SPA
IT·21 granted patents·31 pending applications·642 citations·filing 1995–2025
Top patents by PatentIndex Score
52 records- 0195US6648974B1Device and method for handling substrates by means of a self-leveling vacuum system in epitaxial inductionLPE SPA·Filed 1999·Granted Nov 18, 2003·555 cites·15 claims
- 0284US11377754B2Epitaxial deposition reactor with reflector external to the reaction chamber and cooling method of a susceptor and substratesLPE SPA·Filed 2017·Granted Jul 5, 2022·2 cites·11 claims
- 0384US2026015726A1Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal section and reactorLPE SPA·Filed 2025·Application pending·0 cites
- 0483US7314526B1Reaction chamber for an epitaxial reactorLPE SPA·Filed 2000·Granted Jan 1, 2008·32 cites·19 claims
- 0574US10211085B2Tool for manipulating substrates, manipulation method and epitaxial reactorLPE SPA·Filed 2016·Granted Feb 19, 2019·2 cites·17 claims
- 0673US2025167028A1Automation system for a removable reaction unit of an epitaxial reactorLPE SPA·Filed 2024·Application pending·0 cites
- 0773US2025163608A1Reactor with removable reaction unitLPE SPA·Filed 2024·Application pending·0 cites
- 0872US11834753B2Reactor for epitaxial deposition with a heating inductor with movable turnsLPE SPA·Filed 2021·Granted Dec 5, 2023·0 cites·4 claims
- 0971US2025140597A1Substrate support device for a reaction chamber of an epitaxial reactor with gas flow rotation, reaction chamber and epitaxial reactorLPE SPA·Filed 2024·Application pending·0 cites
- 1069US12435420B2Reaction chamber for an epitaxial reactor of semiconductor material with non-uniform longitudinal section and reactorLPE SPA·Filed 2019·Granted Oct 7, 2025·0 cites·11 claims
- 1167US6579361B2Chemical vapor deposition epitaxial reactor having two reaction chambers alternatively actuated and actuating method thereofLPE SPA·Filed 2001·Granted Jun 17, 2003·7 cites·14 claims
- 1265US6022412AEpitaxial reactor, susceptor and gas-flow systemLPE SPA·Filed 1995·Granted Feb 8, 2000·32 cites·31 claims
- 1364US7153368B2Susceptor with epitaxial growth control devices and epitaxial reactor using the sameLPE SPA·Filed 2002·Granted Dec 26, 2006·12 cites·10 claims
- 1464US2025084559A1Reactor for epitaxial deposition of semiconductor material on substrates with sliding sledge for reaction chamberLPE SPA·Filed 2024·Application pending·0 cites
- 1564US2025137122A1Two-chamber reactor for epitaxial deposition of semiconductor material on substratesLPE SPA·Filed 2024·Application pending·0 cites
- 1663US12485458B2Method for removing layers of silicon carbide, as well as process and apparatus for cleaning epitaxial reactor componentsLPE SPA·Filed 2024·Granted Dec 2, 2025·0 cites·16 claims
- 1763US2026009154A1Reaction chamber assemblyLPE SPA·Filed 2025·Application pending·0 cites
- 1862US2026043131A1Etching of silicon carbide films from reactor partsLPE SPA·Filed 2025·Application pending·0 cites
- 1962US2019256999A1Heating method for a reactor for epitaxial deposition and reactor for epitaxial depositionLPE SPA·Filed 2017·Application pending·0 cites
- 2061US2025243600A1Reactor casing assemblyLPE SPA·Filed 2025·Application pending·0 cites
- 2160US2025129508A1Angular speed measurement system for substrates used in epitaxial deposition reactorsLPE SPA·Filed 2024·Application pending·0 cites
- 2260US2026071320A1Photon-assisted chemical etching of silicon carbide films from reaction chamber partsLPE SPA·Filed 2025·Application pending·0 cites
- 2360US2025146172A1Fast cooling of reactor from high temperaturesLPE SPA·Filed 2024·Application pending·0 cites
- 2460US2025167017A1Multi-chamber assembly for handling removable epitaxial reaction unitsLPE SPA·Filed 2024·Application pending·0 cites
- 2558US2025122616A1Apparatus for manufacturing semiconductor devicesLPE SPA·Filed 2024·Application pending·0 cites
- 2657US2025019861A1Process for growing active layers in sequenceLPE SPA·Filed 2024·Application pending·0 cites
- 2757US2025038027A1Wafer loading and unloading system for an epitaxial reactor and an epitaxial reactorLPE SPA·Filed 2024·Application pending·0 cites
- 2857US2025112074A1Wafer cassette loading and unloading system for an epitaxial reaction and an epitaxial reactorLPE SPA·Filed 2024·Application pending·0 cites
- 2956US12195877B2Substrate support device for a reaction chamber of an epitaxial reactor with gas flow rotation, reaction chamber and epitaxial reactorLPE SPA·Filed 2020·Granted Jan 14, 2025·0 cites·11 claims
- 3056US2024417851A1Apparatus for manufacturing semiconductor devicesLPE SPA·Filed 2024·Application pending·0 cites
- 3155US2025372428A1Wafer cassette loading and unloading system for an epitaxial reactor with coaxial actuation system and an epitaxial reactorLPE SPA·Filed 2025·Application pending·0 cites
- 3253US12331423B2Reaction chamber for a deposition reactor with interspace and lower closing element and reactorLPE SPA·Filed 2020·Granted Jun 17, 2025·0 cites·24 claims
- 3352US2024271319A1Reaction chamber with covering system and epitaxial reactorLPE SPA·Filed 2022·Application pending·0 cites
- 3450US12371779B2Reaction chamber comprising a rotating element for the deposition of a semiconductor materialLPE SPA·Filed 2020·Granted Jul 29, 2025·0 cites·13 claims
- 3550US2025290225A1Moncrystalline coatings for reactor parts suitable for the epitaxial deposition of semiconductor filmsLPE SPA·Filed 2025·Application pending·0 cites
- 3649US2022025519A1Deposition reactor with inductors and electromagnetic shieldsLPE SPA·Filed 2019·Application pending·0 cites
- 3742US2023197499A1Tool for handling substrates with overhead screen and relevant handling methods and epitaxial reactorLPE SPA·Filed 2021·Application pending·0 cites
- 3842US2010037825A1Differentiated-temperature reaction chamberLPE SPA·Filed 2006·Application pending·0 cites
- 3941US12522949B2Treating arrangement with storage chamber and epitaxial reactorLPE SPA·Filed 2020·Granted Jan 13, 2026·0 cites·19 claims
- 4041US12522948B2Treating arrangement with loading/unloading group and epitaxial reactorLPE SPA·Filed 2020·Granted Jan 13, 2026·0 cites·20 claims
- 4141US12522947B2Treating arrangement with transfer chamber and epitaxial reactorLPE SPA·Filed 2020·Granted Jan 13, 2026·0 cites·11 claims
- 4239US2008199281A1Vacuum System For Wafer HandlingLPE SPA·Filed 2005·Application pending·0 cites
- 4339US2008190357A1Susceptor for Expitaxial Reactors and Tool for the Handling ThereofLPE SPA·Filed 2006·Application pending·0 cites
- 4439US2008202424A1Device For Introducing Reaction Gases Into A Reaction Chamber And Epitaxial Reactor Which Uses Said DeviceLPE SPA·Filed 2006·Application pending·0 cites
- 4538US12325932B2Method for CVD deposition of n-type doped silicon carbide and epitaxial reactorLPE SPA·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
- 4638US6991420B2Tool for handling wafers and epitaxial growth stationLPE SPA·Filed 2004·Granted Jan 31, 2006·0 cites·19 claims
- 4738US2008210169A1System for Supporting and Rotating a Susceptor Inside a Treatment Chamber of a Wafer Treating ApparatusLPE SPA·Filed 2005·Application pending·0 cites
- 4837US10815585B2Susceptor with substrate clamped by underpressure, and reactor for epitaxial depositionLPE SPA·Filed 2017·Granted Oct 27, 2020·0 cites·15 claims
- 4937US10392723B2Reaction chamber for epitaxial growth with a loading/unloading device and reactorLPE SPA·Filed 2014·Granted Aug 27, 2019·0 cites·14 claims
- 5033US2021189594A1Inductively heatable susceptor and epitaxial deposition reactorLPE SPA·Filed 2017·Application pending·0 cites
Showing the top 50 of 52 patent records by PatentIndex Score.
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