Assignee
SEMEQUIP INC
US·35 granted patents·6 pending applications·982 citations·filing 2000–2013
Top patents by PatentIndex Score
41 records- 0197US6452338B1Electron beam ion source with integral low-temperature vaporizerSEMEQUIP INC·Filed 2000·Granted Sep 17, 2002·151 cites·35 claims
- 0296US7629590B2Method and apparatus for extending equipment uptime in ion implantationSEMEQUIP INC·Filed 2006·Granted Dec 8, 2009·41 cites·22 claims
- 0396US7609003B2Ion implantation system and control methodSEMEQUIP INC·Filed 2006·Granted Oct 27, 2009·43 cites·5 claims
- 0496US7022999B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2004·Granted Apr 4, 2006·66 cites·31 claims
- 0596US6686595B2Electron impact ion sourceSEMEQUIP INC·Filed 2002·Granted Feb 3, 2004·77 cites·6 claims
- 0695US7834554B2Dual mode ion source for ion implantationSEMEQUIP INC·Filed 2007·Granted Nov 16, 2010·20 cites·28 claims
- 0795US7666771B2System and method for the manufacture of semiconductor devices by the implantation of carbon clustersSEMEQUIP INC·Filed 2006·Granted Feb 23, 2010·30 cites·2 claims
- 0895US7491953B2Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsSEMEQUIP INC·Filed 2006·Granted Feb 17, 2009·25 cites·8 claims
- 0995US7185602B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2004·Granted Mar 6, 2007·54 cites·23 claims
- 1095US7107929B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2002·Granted Sep 19, 2006·61 cites·70 claims
- 1194US8013312B2Vapor delivery system useful with ion sources and vaporizer for use in such systemSEMEQUIP INC·Filed 2007·Granted Sep 6, 2011·26 cites·56 claims
- 1294US7800312B2Dual mode ion source for ion implantationSEMEQUIP INC·Filed 2006·Granted Sep 21, 2010·14 cites·21 claims
- 1394US7641879B2Methods of synthesis of isotopically enriched borohydride and methods of synthesis of isotopically enriched boranesSEMEQUIP INC·Filed 2005·Granted Jan 5, 2010·23 cites·22 claims
- 1493US7838850B2External cathode ion sourceSEMEQUIP INC·Filed 2008·Granted Nov 23, 2010·24 cites·14 claims
- 1593US7838842B2Dual mode ion source for ion implantationSEMEQUIP INC·Filed 2005·Granted Nov 23, 2010·17 cites·22 claims
- 1692US7791047B2Method and apparatus for extracting ions from an ion source for use in ion implantationSEMEQUIP INC·Filed 2006·Granted Sep 7, 2010·17 cites·5 claims
- 1792US7112804B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2004·Granted Sep 26, 2006·37 cites·5 claims
- 1891US6744214B2Electron beam ion source with integral low-temperature vaporizerSEMEQUIP INC·Filed 2002·Granted Jun 1, 2004·44 cites·11 claims
- 1990US7919402B2Cluster ion implantation for defect engineeringSEMEQUIP INC·Filed 2008·Granted Apr 5, 2011·25 cites·17 claims
- 2090US7479643B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2005·Granted Jan 20, 2009·9 cites·13 claims
- 2190US7064491B2Ion implantation system and control methodSEMEQUIP INC·Filed 2001·Granted Jun 20, 2006·40 cites·27 claims
- 2289US7394202B2Ion implantation system and control methodSEMEQUIP INC·Filed 2006·Granted Jul 1, 2008·12 cites·1 claims
- 2387US7820981B2Method and apparatus for extending equipment uptime in ion implantationSEMEQUIP INC·Filed 2004·Granted Oct 26, 2010·30 cites·62 claims
- 2485US7928406B2Method and system for extracting ion beams composed of molecular ions (cluster ion beam extraction system)SEMEQUIP INC·Filed 2008·Granted Apr 19, 2011·8 cites·9 claims
- 2585US7732787B2Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2006·Granted Jun 8, 2010·5 cites·4 claims
- 2682US8368309B2Method and apparatus for extracting ions from an ion source for use in ion implantationSEMEQUIP INC·Filed 2006·Granted Feb 5, 2013·6 cites·23 claims
- 2781US7723700B2Controlling the flow of vapors sublimated from solidsSEMEQUIP INC·Filed 2004·Granted May 25, 2010·20 cites·40 claims
- 2881US7524477B2Method of production of B10H102− ammonium salts and methods of production of B18H22SEMEQUIP INC·Filed 2005·Granted Apr 28, 2009·8 cites·15 claims
- 2979US7960709B2Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsSEMEQUIP INC·Filed 2003·Granted Jun 14, 2011·18 cites·20 claims
- 3077US7023138B2Electron impact ion sourceSEMEQUIP INC·Filed 2003·Granted Apr 4, 2006·11 cites·4 claims
- 3176US7875125B2Method for extending equipment uptime in ion implantationSEMEQUIP INC·Filed 2008·Granted Jan 25, 2011·2 cites·6 claims
- 3275US7528550B2Ion implantation system and control methodSEMEQUIP INC·Filed 2006·Granted May 5, 2009·3 cites·36 claims
- 3372US7723233B2Semiconductor device and method of fabricating a semiconductor deviceSEMEQUIP INC·Filed 2003·Granted May 25, 2010·12 cites·23 claims
- 3466US7955580B2Isotopically-enriched boranes and methods of preparing themSEMEQUIP INC·Filed 2005·Granted Jun 7, 2011·2 cites·13 claims
- 3564US7994031B2Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ionsSEMEQUIP INC·Filed 2006·Granted Aug 9, 2011·1 cites·42 claims
- 3659US2014061816A1Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsSEMEQUIP INC·Filed 2013·Application pending·0 cites
- 3756US2007181830A1Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ionsSEMEQUIP INC·Filed 2006·Application pending·0 cites
- 3855US2007170372A1Dual mode ion source for ion implantationSEMEQUIP INC·Filed 2006·Application pending·0 cites
- 3955US2008042580A1Dual mode ion source for ion implantationSEMEQUIP INC·Filed 2006·Application pending·0 cites
- 4049US2007107841A1Ion implantation ion source, system and methodSEMEQUIP INC·Filed 2006·Application pending·0 cites
- 4144US2008200020A1Semiconductor device and method of fabricating a semiconductor deviceSEMEQUIP INC·Filed 2006·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when SEMEQUIP INC files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →