Assignee
SPUTTERING COMPONENTS INC
US·9 granted patents·7 pending applications·53 citations·filing 2002–2017
Top patents by PatentIndex Score
16 records- 0192US6841051B2High-power ion sputtering magnetronSPUTTERING COMPONENTS INC·Filed 2004·Granted Jan 11, 2005·40 cites·17 claims
- 0279USRE46599ESputtering apparatusSPUTTERING COMPONENTS INC·Filed 2016·Granted Nov 7, 2017·2 cites·45 claims
- 0375US9198274B2Ion control for a plasma sourceSPUTTERING COMPONENTS INC·Filed 2013·Granted Nov 24, 2015·1 cites·14 claims
- 0472US9312108B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2014·Granted Apr 12, 2016·2 cites·19 claims
- 0569US9406487B2Plasma enhanced chemical vapor deposition (PECVD) sourceSPUTTERING COMPONENTS INC·Filed 2013·Granted Aug 2, 2016·2 cites·20 claims
- 0666US6905579B2Cylindrical magnetron target and spindle apparatusSPUTTERING COMPONENTS INC·Filed 2003·Granted Jun 14, 2005·6 cites·16 claims
- 0753US2011155568A1Indexing magnet assembly for rotary sputtering cathodeSPUTTERING COMPONENTS INC·Filed 2009·Application pending·0 cites
- 0853US2011024987A1Mechanical seal assembly for a rotatable shaftSPUTTERING COMPONENTS INC·Filed 2009·Application pending·0 cites
- 0951US2016225591A1Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2016·Application pending·0 cites
- 1050US10727034B2Magnetic force release for sputtering sources with magnetic target materialsSPUTTERING COMPONENTS INC·Filed 2017·Granted Jul 28, 2020·0 cites·10 claims
- 1146US9758862B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2013·Granted Sep 12, 2017·0 cites·20 claims
- 1244US9418823B2Sputtering apparatusSPUTTERING COMPONENTS INC·Filed 2013·Granted Aug 16, 2016·0 cites·19 claims
- 1343US2013032476A1Rotary cathodes for magnetron sputtering systemSPUTTERING COMPONENTS INC·Filed 2012·Application pending·0 cites
- 1443US2015120001A1Decentralized process controllerSPUTTERING COMPONENTS INC·Filed 2013·Application pending·0 cites
- 1541US2003173217A1High-power ion sputtering magnetronSPUTTERING COMPONENTS INC·Filed 2002·Application pending·0 cites
- 1632US2016064191A1Ion control for a plasma sourceSPUTTERING COMPONENTS INC·Filed 2015·Application pending·0 cites
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