Inventor · disambiguated record
Jun Jung Kim
Also filed as: KIM JUN JUNG
15 granted patents·5 pending applications·83 citations·filing 2005–2016
90Inventor score
Files withSAMSUNG ELECTRONICS CO LTD6IBM4CHARTERED SEMICONDUCTOR MFG3KIM JUN-JUNG2LG DISPLAY CO LTD2
Top patents by PatentIndex Score
20 records- 0194US7297584B2Methods of fabricating semiconductor devices having a dual stress linerSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Nov 20, 2007·34 cites·12 claims
- 0284US10229876B2Wiring structures and semiconductor devicesKIM JUN JUNG·Filed 2016·Granted Mar 12, 2019·9 cites·20 claims
- 0382US8338245B2Integrated circuit system employing stress-engineered spacersLEE JAE GON·Filed 2008·Granted Dec 25, 2012·10 cites·10 claims
- 0480US7785950B2Dual stress memory technique method and related structureIBM·Filed 2005·Granted Aug 31, 2010·9 cites·13 claims
- 0580US7612414B2Overlapped stressed liners for improved contactsIBM·Filed 2007·Granted Nov 3, 2009·7 cites·11 claims
- 0672US7923365B2Methods of forming field effect transistors having stress-inducing sidewall insulating spacers thereonSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Apr 12, 2011·4 cites·15 claims
- 0768US7838390B2Methods of forming integrated circuit devices having ion-cured electrically insulating layers thereinSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Nov 23, 2010·4 cites·7 claims
- 0866US7585773B2Non-conformal stress liner for enhanced MOSFET performanceIBM·Filed 2006·Granted Sep 8, 2009·3 cites·8 claims
- 0966US7541288B2Methods of forming integrated circuit structures using insulator deposition and insulator gap filling techniquesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Jun 2, 2009·2 cites·23 claims
- 1058US8865486B2Organic light emitting display device and method for fabricating the sameLG DISPLAY CO LTD·Filed 2014·Granted Oct 21, 2014·0 cites·6 claims
- 1157US8227308B2Method of fabricating semiconductor integrated circuit deviceLIM HA-JIN·Filed 2009·Granted Jul 24, 2012·1 cites·11 claims
- 1255US8742436B2Organic light emitting display device and method for fabricating the sameLG DISPLAY CO LTD·Filed 2012·Granted Jun 3, 2014·0 cites·5 claims
- 1351US2008029823A1Semiconductor Device Having a Dual Stress Liner and Light Exposure Apparatus for Forming the Dual Stress LinerCHARTERED SEMICONDUCTOR MFG·Filed 2007·Application pending·0 cites
- 1446US7504309B2Pre-silicide spacer removalIBM·Filed 2006·Granted Mar 17, 2009·0 cites·6 claims
- 1545US7790622B2Methods for removing gate sidewall spacers in CMOS semiconductor fabrication processesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 7, 2010·0 cites·36 claims
- 1642US2008142897A1Integrated circuit system having strained transistorCHARTERED SEMICONDUCTOR MFG·Filed 2006·Application pending·0 cites
- 1740US2009014807A1Dual stress liners for integrated circuitsCHARTERED SEMICONDUCTOR MFG·Filed 2007·Application pending·0 cites
- 1839US2011156110A1Field Effect Transistors Having Gate Electrode Silicide Layers with Reduced Surface DamageKIM JUN-JUNG·Filed 2011·Application pending·0 cites
- 1938US2009050972A1Strained Semiconductor Device and Method of Making SameLINDSAY RICHARD·Filed 2007·Application pending·0 cites
- 2037US9716043B2Wiring structure and method of forming the same, and semiconductor device including the wiring structureSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 25, 2017·0 cites·20 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →