Inventor
FUKUSHIMA KOHEI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “FUKUSHIMA KOHEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS7758920B2Jul 20, 2010
Method and apparatus for forming silicon-containing insulating film
TOKYO ELECTRON LTD81 citations98
US7825039B2Nov 2, 2010
Vertical plasma processing method for forming silicon containing film
TOKYO ELECTRON LTD79 citations96
US7156923B2Jan 2, 2007
Silicon nitride film forming method, silicon nitride film forming system and silicon nitride film forming system precleaning method
TOKYO ELECTRON LTD19 citations92
US6844273B2Jan 18, 2005
Precleaning method of precleaning a silicon nitride film forming system
TOKYO ELECTRON LTD20 citations92
US11560628B2Jan 24, 2023
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations72
US10287682B2May 14, 2019
Substrate processing apparatus, gas supply method, substrate processing method, and film forming method
TOKYO ELECTRON LTD2 citations72
USD786810SMay 16, 2017
Dummy wafer
TOKYO ELECTRON LTD4 citations72
USD784937SApr 25, 2017
Dummy wafer
TOKYO ELECTRON LTD2 citations72
US10475641B2Nov 12, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations71
US12281389B2Apr 22, 2025
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US12054828B2Aug 6, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations62
US7462376B2Dec 9, 2008
CVD method for forming silicon nitride film
TOKYO ELECTRON LTD4 citations60
US11208721B2Dec 28, 2021
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations52
US9970111B2May 15, 2018
Substrate processing apparatus having ground electrode
TOKYO ELECTRON LTD1 citations51
USD785576SMay 2, 2017
Dummy wafer
TOKYO ELECTRON LTD1 citations51
US9624579B2Apr 18, 2017
Film forming apparatus, film forming method, and non-transitory computer-readable storage medium
TOKYO ELECTRON LTD1 citations51
US11282721B2Mar 22, 2022
Vertical heat treatment apparatus
TOKYO ELECTRON LTD0 citations48
US9776202B2Oct 3, 2017
Driving method of vertical heat treatment apparatus, storage medium and vertical heat treatment apparatus
TOKYO ELECTRON LTD0 citations41
US9487859B2Nov 8, 2016
Operating method of vertical heat treatment apparatus, storage medium, and vertical heat treatment apparatus
TOKYO ELECTRON LTD0 citations41