Inventor

HASEGAWA KOJI

JP259 patents

⚠️ This page may combine multiple inventors who share the name “HASEGAWA KOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HASEGAWA KOJI

SHINETSU CHEMICAL CO

Polymer, resist composition, and patterning process

Acid-decomposable ester compound suitable for use in resist material

Ester compounds, polymers, resist compositions and patterning process

Lactone-containing compounds, polymers, resist compositions, and patterning method

Polymer, resist protective coating material, and patterning process

Tertiary amine compounds having an ester structure and processes for preparing same

Ester compounds, polymers, resist composition and patterning process

Fluorinated monomer, fluorinated polymer, resist composition and patterning process

Polymer, resist protective coating material, and patterning process

Resist composition and patterning process

Photoacid generators, resist compositions, and patterning process

(Meth)acrylates having lactone structure, polymers, photoresist compositions and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymers, resist compositions and patterning process

Ester compounds, polymers, resist composition and patterning process

Ester compounds, polymers, resist compositions and patterning process

Monomer, polymer, resist composition, and patterning process

Resist composition and patterning process

Positive resist composition and patterning process

Negative resist composition and patterning process

Silicone-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

Lactone-containing compound, polymer, resist composition, and patterning process

Lactone-containing compounds, polymers, resist compositions, and patterning method

Patterning process and resist composition

Polymers, resist compositions and patterning process

Lactone-containing compound, polymer, resist composition, and patterning process

Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process

Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation

Polymers, resist compositions and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Polymer, resist composition and patterning process

Resist compositions and patterning process

SONY CORP

GPS receiver and portable communication apparatus

GPS receiver and GPS position measurement method

GPS receiver and GPS reception method

HATAKEYAMA JUN

Monomer, polymer, chemically amplified positive resist composition, and patterning process

Patterning process, resist composition, and acetal compound

OGIHARA TSUTOMU

Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method

Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process

NISSHIN OIL MILLS LTD

Process for preparing hydrolyzed products of soy protein

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

Surface acoustic wave device, and mobile communication device and sensor both using same

SHOWA DENKO KK

Method for manufacturing an extruded article changing in cross-section and an apparatus for extruding said extruded article

DAINIPPON SCREEN MFG

Substrate processing apparatus

HARADA YUJI

Resist composition and patterning process

OHSAWA YOUICHI

Photoacid generator, resist composition, and patterning process

EUDYNA DEVICES INC

Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process

POWREX KK

Coating apparatus