Inventor
TAKEBAYASHI YUJI
JP35 patents
⚠️ This page may combine multiple inventors who share the name “TAKEBAYASHI YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
14 patentsUS10640869B2May 5, 2020
Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP3 citations73
US12387962B2Aug 12, 2025
Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11996311B2May 28, 2024
Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations62
US11031270B2Jun 8, 2021
Substrate processing apparatus, substrate holder and mounting tool
KOKUSAI ELECTRIC CORP1 citations62
US12476129B2Nov 18, 2025
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US11869790B2Jan 9, 2024
Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium
KOKUSAI ELECTRIC CORP0 citations61
US12435423B2Oct 7, 2025
Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations60
US12371788B2Jul 29, 2025
Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations60
US12540399B2Feb 3, 2026
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations52
US12509768B2Dec 30, 2025
Method of manufacturing semiconductor device, substrate processing apparatus and evaporation system
KOKUSAI ELECTRIC CORP0 citations52
US12354887B2Jul 8, 2025
Cleaning method, method of manufacturing semiconductor device, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations52
US12293932B2May 6, 2025
Substrate processing apparatus, elevator and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations52
US11299804B2Apr 12, 2022
Method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations52
US12188124B2Jan 7, 2025
Substrate processing apparatus, gas nozzle and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations43
HITACHI INT ELECTRIC INC
10 patentsUS9708708B2Jul 18, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC465 citations98
USD610559SFeb 23, 2010
Reaction tube
HITACHI INT ELECTRIC INC26 citations91
US8343277B2Jan 1, 2013
Substrate processing apparatus
HITACHI INT ELECTRIC INC10 citations84
USD828091SSep 11, 2018
Gas supply nozzle
HITACHI INT ELECTRIC INC8 citations80
US11020760B2Jun 1, 2021
Substrate processing apparatus and precursor gas nozzle
HITACHI INT ELECTRIC INC3 citations69
US9437421B2Sep 6, 2016
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
HITACHI INT ELECTRIC INC2 citations62
US9768012B2Sep 19, 2017
Method for processing substrate and substrate processing apparatus
HITACHI INT ELECTRIC INC1 citations52
US9646821B2May 9, 2017
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US8741731B2Jun 3, 2014
Method of manufacturing a semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US8012259B2Sep 6, 2011
Substrate processing apparatus
HITACHI INT ELECTRIC INC0 citations42