Inventor

CHIANG HSIN-CHE

TW62 patents

⚠️ This page may combine multiple inventors who share the name “CHIANG HSIN-CHE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHIANG HSIN-CHE

TAIWAN SEMICONDUCTOR MFG CO LTD

Semiconductor structure and manufacturing process thereof

FinFET device with reduced parasitic capacitance and method for fabricating the same

Epitaxial blocking layer for multi-gate devices and fabrication methods thereof

Epitaxial blocking layer for multi-gate devices and fabrication methods thereof

Semiconductor device and method of forming the same

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Nanosheet CMOS device and method of forming

Semiconductor device and method for manufacturing the same

Method of forming a gate structure of a semiconductor device

Semiconductor device gate structure and method of fabricating thereof

Semiconductor device structure with uniform threshold voltage distribution and method of forming the same

Semiconductor device and method of manufacture

Methods of forming metal gates

Semiconductor device and method of forming the same

Gate dielectric having a non-uniform thickness profile

Gate resistance improvement and method thereof

Semiconductor device structures

Structure and formation method of semiconductor device with dielectric fin

Semiconductor device and method of forming the same

Semiconductor device and manufacturing method thereof

Semiconductor devices and methods of manufacture

Semiconductor device and method of manufacture

Semiconductor device structures

Metal gate using monolayers

Semiconductor device and method of forming the same

Semiconductor devices and methods of manufacture

Semiconductor device structure having a plurality of threshold voltages and method of forming the same

Gate resistance improvement and method thereof

Semiconductor device structure with uniform threshold voltage distribution and method of forming the same

Semiconductor device

Semiconductor device and method of manufacture

Semiconductor device and manufacturing method thereof

Gate dielectric having a non-uniform thickness profile

Semiconductor device structures

Semiconductor device and method of forming the same

Semiconductor device structure with uniform threshold voltage distribution and method of forming the same

Metal gate using monolayers

Semiconductor device and method for manufacturing the same

Semiconductor structure and method for forming the same

Semiconductor device and method of forming the same

Gate resistance improvement and method thereof

Semiconductor device structure having a plurality of threshold voltages and method of forming the same

Methods of fabricating semiconductor devices having gate structure with bent sidewalls

Method for forming semiconductor structure

Fin field effect transistor (FinFET) device structure with air gap and method for forming the same

Multilayer gate isolation structure

Methods of forming metal gates

Method for forming semiconductor structure

UNIV NAT CHENG KUNG

Method for manufacturing organic light-emitting diodes