Inventor · disambiguated record
Zhenyu Bao
Also filed as: BAO ZHENYU
5 granted patents·1 pending application·3 citations·filing 2012–2016
65Inventor score
Technology areasH10P
Top patents by PatentIndex Score
6 records- 0167US9828527B2Chemical-mechanical polishing compositions comprising N,N,N′,N′-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acidBASF SE·Filed 2016·Granted Nov 28, 2017·1 cites·6 claims
- 0267US9765239B2Use of a chemical-mechanical polishing (CMP) composition for polishing a substrate or layer containing at least one III-V materialBASF SE·Filed 2014·Granted Sep 19, 2017·2 cites·13 claims
- 0350US9862862B2Chemical-mechanical polishing compositions comprising polyethylene imineBASF SE·Filed 2014·Granted Jan 9, 2018·0 cites·11 claims
- 0449US2016009955A1Chemical-mechanical polishing compositions comprising n,n,n',n'-tetrakis-(2-hydroxypropyl)-ethylenediamine or methanesulfonic acidBASF SE·Filed 2014·Application pending·0 cites
- 0545US10090159B2Chemical-mechanical polishing compositions comprising one or more polymers selected from the group consisting of N-vinyl-homopolymers and N-vinyl copolymersBASF SE·Filed 2014·Granted Oct 2, 2018·0 cites·14 claims
- 0635US10407594B2Chemical mechanical polishing (CMP) composition comprising a polymeric polyamineNOLLER BASTIAN MARTEN·Filed 2012·Granted Sep 10, 2019·0 cites·12 claims
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