Inventor · disambiguated record
Vikas Sachan
Also filed as: SACHAN VIKAS
7 granted patents·6 pending applications·120 citations·filing 1999–2016
86Inventor score
Top patents by PatentIndex Score
13 records- 0185US6699299B2Composition and method for polishing in metal CMPRODEL INC·Filed 2003·Granted Mar 2, 2004·34 cites·21 claims
- 0282US6616717B2Composition and method for polishing in metal CMPRODEL INC·Filed 2001·Granted Sep 9, 2003·28 cites·22 claims
- 0379US6602112B2Dissolution of metal particles produced by polishingRODEL INC·Filed 2001·Granted Aug 5, 2003·22 cites·15 claims
- 0476US6447373B1Chemical mechanical polishing slurries for metalRODEL INC·Filed 2000·Granted Sep 10, 2002·21 cites·31 claims
- 0559US10146036B2Semiconductor wafer inspection using care area group-specific threshold settings for detecting defectsGLOBALFOUNDRIES INC·Filed 2016·Granted Dec 4, 2018·1 cites·20 claims
- 0649US7270762B2Polishing compositions for noble metalsROHM & HAAS ELECT MAT·Filed 2003·Granted Sep 18, 2007·2 cites·10 claims
- 0744US6693035B1Methods to control film removal rates for improved polishing in metal CMPRODEL INC·Filed 1999·Granted Feb 17, 2004·12 cites·3 claims
- 0838US2002039839A1Polishing compositions for noble metalsFiled 2001·Application pending·0 cites
- 0935US2003006396A1Polishing composition for CMP having abrasive particlesFiled 2002·Application pending·0 cites
- 1035US2002111027A1Polishing compositions for noble metalsFiled 2000·Application pending·0 cites
- 1133US2001013507A1Method for CMP of low dielectric constant polymer layersFiled 2000·Application pending·0 cites
- 1231US2002019202A1Control of removal rates in CMPFiled 2001·Application pending·0 cites
- 1328US2003139069A1Planarization of silicon carbide hardmask materialFiled 2002·Application pending·0 cites
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