Inventor · disambiguated record
Jean-Paul Booth
Also filed as: BOOTH JEAN-PAUL
16 granted patents·2 pending applications·172 citations·filing 1996–2017
93Inventor score
Top patents by PatentIndex Score
18 records- 0193US8358416B2Methods and apparatus for normalizing optical emission spectraLAM RES CORP·Filed 2012·Granted Jan 22, 2013·11 cites·19 claims
- 0291US9129779B2Processing system for detecting in-situ arcing events during substrate processingBOOTH JEAN-PAUL·Filed 2012·Granted Sep 8, 2015·9 cites·20 claims
- 0386US8179152B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted May 15, 2012·8 cites·13 claims
- 0486US8144328B2Methods and apparatus for normalizing optical emission spectraVENUGOPAL VIJAYAKUMAR C·Filed 2009·Granted Mar 27, 2012·15 cites·19 claims
- 0583US9153421B2Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2012·Granted Oct 6, 2015·5 cites·20 claims
- 0679US5936413AMethod and device for measuring an ion flow in a plasmaCENTRE NAT RECH SCIENT·Filed 1996·Granted Aug 10, 1999·93 cites·11 claims
- 0778US10796885B2Circuit for impedance matching between a generator and a load at multiple frequencies, assembly comprising such a circuit and related useCENTRE NAT RECH SCIENT·Filed 2017·Granted Oct 6, 2020·3 cites·11 claims
- 0876US8159233B2Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 17, 2012·6 cites·20 claims
- 0975US8164349B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·8 cites·20 claims
- 1070US8780522B2Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereofBOOTH JEAN-PAUL·Filed 2009·Granted Jul 15, 2014·3 cites·20 claims
- 1169US8968838B2Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitationBOOTH JEAN-PAUL·Filed 2011·Granted Mar 3, 2015·2 cites·14 claims
- 1267US10319565B2Method and system for controlling ion flux in an RF plasmaECOLE POLYTECH·Filed 2015·Granted Jun 11, 2019·2 cites·19 claims
- 1365US8894804B2Plasma unconfinement sensor and methods thereofBOOTH JEAN-PAUL·Filed 2008·Granted Nov 25, 2014·1 cites·29 claims
- 1464US8547085B2Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Oct 1, 2013·4 cites·4 claims
- 1561US8164353B2RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamberBOOTH JEAN-PAUL·Filed 2009·Granted Apr 24, 2012·1 cites·20 claims
- 1660US8849585B2Methods for automatically characterizing a plasmaKEIL DOUGLAS·Filed 2009·Granted Sep 30, 2014·1 cites·9 claims
- 1752US2014367042A1Systems for automatically characterizing a plasmaLAM RES CORP·Filed 2014·Application pending·0 cites
- 1843US2015179406A1Electrical circuit to impedance match a source and a load at multiple frequencies, method to design such a circuitECOLE POLYTECH·Filed 2013·Application pending·0 cites
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