Inventor · disambiguated record
Katrina Mikhaylich
Also filed as: MIKHAYLICH KATRINA · MIKHAYLICH KATRINA A
24 granted patents·5 pending applications·445 citations·filing 1998–2011
97Inventor score
Top patents by PatentIndex Score
29 records- 0195US6361414B1Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization processLAM RES CORP·Filed 2000·Granted Mar 26, 2002·83 cites·20 claims
- 0291US6435952B1Apparatus and method for qualifying a chemical mechanical planarization processLAM RES CORP·Filed 2000·Granted Aug 20, 2002·36 cites·13 claims
- 0388US6616516B1Method and apparatus for asymmetric processing of front side and back side of semiconductor substratesLAM RES CORP·Filed 2001·Granted Sep 9, 2003·42 cites·22 claims
- 0486US6622335B1Drip manifold for uniform chemical deliveryLAM RES CORP·Filed 2000·Granted Sep 23, 2003·32 cites·22 claims
- 0582US6471566B1Sacrificial retaining ring CMP system and methods for implementing the sameLAM RES CORP·Filed 2000·Granted Oct 29, 2002·23 cites·28 claims
- 0681US6431959B1System and method of defect optimization for chemical mechanical planarization of polysiliconLAM RES CORP·Filed 1999·Granted Aug 13, 2002·52 cites·22 claims
- 0781US6375540B1End-point detection system for chemical mechanical posing applicationsLAM RES CORP·Filed 2000·Granted Apr 23, 2002·17 cites·12 claims
- 0879US6858091B2Method for controlling galvanic corrosion effects on a single-wafer cleaning systemLAM RES CORP·Filed 2001·Granted Feb 22, 2005·19 cites·20 claims
- 0977US7231682B1Method and apparatus for simultaneously cleaning the front side and back side of a waferLAM RES CORP·Filed 2003·Granted Jun 19, 2007·19 cites·14 claims
- 1073US6994611B2Method and system for cleaning a chemical mechanical polishing padLAM RES CORP·Filed 2001·Granted Feb 7, 2006·11 cites·29 claims
- 1172US6845778B2In-situ local heating using megasonic transducer resonatorLAM RES CORP·Filed 2002·Granted Jan 25, 2005·14 cites·24 claims
- 1270US7270597B2Method and system for chemical mechanical polishing pad cleaningLAM RES CORP·Filed 2005·Granted Sep 18, 2007·3 cites·5 claims
- 1369US6170110B1Apparatus for HF-HF cleaningLAM RES CORP·Filed 2000·Granted Jan 9, 2001·13 cites·3 claims
- 1467US7029369B2End-point detection apparatusLAM RES CORP·Filed 2003·Granted Apr 18, 2006·8 cites·16 claims
- 1566US6800020B1Web-style pad conditioning system and methods for implementing the sameLAM RES CORP·Filed 2000·Granted Oct 5, 2004·10 cites·6 claims
- 1663US8051863B2Methods of and apparatus for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscusLAM RES CORP·Filed 2008·Granted Nov 8, 2011·2 cites·15 claims
- 1761US6726530B2End-point detection system for chemical mechanical polishing applicationsLAM RES CORP·Filed 2002·Granted Apr 27, 2004·6 cites·13 claims
- 1855US8287656B2Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscusPENG G GRANT·Filed 2011·Granted Oct 16, 2012·1 cites·9 claims
- 1955US6352595B1Method and system for cleaning a chemical mechanical polishing padLAM RES CORP·Filed 1999·Granted Mar 5, 2002·13 cites·42 claims
- 2054US6679763B2Apparatus and method for qualifying a chemical mechanical planarization processLAM RES CORP·Filed 2002·Granted Jan 20, 2004·4 cites·20 claims
- 2154US6537381B1Method for cleaning and treating a semiconductor wafer after chemical mechanical polishingLAM RES CORP·Filed 1999·Granted Mar 25, 2003·19 cites·15 claims
- 2248US6711775B2System for cleaning a semiconductor waferLAM RES CORP·Filed 1999·Granted Mar 30, 2004·12 cites·12 claims
- 2348US2005121059A1Apparatus for controlling galvanic corrosion effects on a single-wafer cleaning systemLAM RES CORP·Filed 2005·Application pending·0 cites
- 2445US2008148595A1Method and apparatus for drying substrates using a surface tensions reducing gasLAM RES CORP·Filed 2006·Application pending·0 cites
- 2543US6827793B2Drip manifold for uniform chemical deliveryLAM RES CORP·Filed 2003·Granted Dec 7, 2004·0 cites·20 claims
- 2642US2004216764A1Method and system for cleaning a semiconductor waferLAM RES CORP·Filed 2004·Application pending·0 cites
- 2741US2003060126A1System and method of defect optimization for chemical mechanical planarization of polysiliconLAM RES CORP·Filed 2002·Application pending·0 cites
- 2836US6093254AMethod of HF-HF CleaningLAM RES CORP·Filed 1998·Granted Jul 25, 2000·6 cites·19 claims
- 2929US2002031914A1Post-plasma processing wafer cleaning method and systemFiled 1999·Application pending·0 cites
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