Inventor · disambiguated record
Karel Diederick Van Der Mast
Also filed as: MAST KAREL DIEDERICK VAN DER · VAN DER MAST KAREL · VAN DER MAST KAREL D · VAN DER MAST KAREL DIEDERICK
51 granted patents·3 pending applications·1,850 citations·filing 1976–2020
99Inventor score
Files withPHILIPS CORP16ASML NETHERLANDS BV15ASML HOLDING NV6PHENOM-WORLD HOLDING B V4PHILIPS ELECTRON OPTICS BV3
Top patents by PatentIndex Score
54 records- 0197US6778257B2Imaging apparatusASML NETHERLANDS BV·Filed 2002·Granted Aug 17, 2004·953 cites·28 claims
- 0297US6633366B2Lithographic apparatus, device manufacturing method, and device manufactured therebyFiled 2001·Granted Oct 14, 2003·76 cites·49 claims
- 0396US7517211B2Imprint lithographyASML NETHERLANDS BV·Filed 2005·Granted Apr 14, 2009·27 cites·17 claims
- 0495US7502103B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2006·Granted Mar 10, 2009·18 cites·24 claims
- 0593US8363220B2Method of determining overlay error and a device manufacturing methodASML NETHERLANDS BV·Filed 2010·Granted Jan 29, 2013·9 cites·20 claims
- 0692US7656518B2Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatusASML NETHERLANDS BV·Filed 2007·Granted Feb 2, 2010·15 cites·11 claims
- 0792US4766340ASemiconductor device having a cold cathodeMAST KAREL D V D·Filed 1987·Granted Aug 23, 1988·70 cites·10 claims
- 0891US7878791B2Imprint lithographyASML NETHERLANDS BV·Filed 2006·Granted Feb 1, 2011·14 cites·26 claims
- 0991US5221844ACharged particle beam devicePHILIPS CORP·Filed 1992·Granted Jun 22, 1993·71 cites·15 claims
- 1089US7259831B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuationASML HOLDING NV·Filed 2006·Granted Aug 21, 2007·8 cites·7 claims
- 1189US5986270AParticle-optical apparatus including a low-temperature specimen holderPHILIPS CORP·Filed 1997·Granted Nov 16, 1999·71 cites·14 claims
- 1289US4618766AAutomatically adjustable electron microscopePHILIPS CORP·Filed 1985·Granted Oct 21, 1986·46 cites·13 claims
- 1388US7116403B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 3, 2006·30 cites·14 claims
- 1488US7023526B2Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuationASML HOLDING NV·Filed 2003·Granted Apr 4, 2006·22 cites·15 claims
- 1588US6946654B2Collection of secondary electrons through the objective lens of a scanning electron microscopeFEI CO·Filed 2001·Granted Sep 20, 2005·30 cites·31 claims
- 1688US6191423B1Correction device for correcting the spherical aberration in particle-optical apparatusPHILIPS ELECTRON OPTICS BV·Filed 1998·Granted Feb 20, 2001·50 cites·9 claims
- 1787US7586598B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2007·Granted Sep 8, 2009·7 cites·26 claims
- 1885US7046413B2System and method for dose control in a lithographic systemASML HOLDING NV·Filed 2005·Granted May 16, 2006·6 cites·23 claims
- 1985US6365896B1Environmental SEM with a magnetic field for improved secondary electron directionPHILIPS ELECTRON OPTICS BV·Filed 1998·Granted Apr 2, 2002·46 cites·26 claims
- 2083US8100684B2Imprint lithographyKRUIJT-STEGEMAN YVONNE WENDELA·Filed 2009·Granted Jan 24, 2012·5 cites·22 claims
- 2181US7961309B2Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrateASML NETHERLANDS BV·Filed 2009·Granted Jun 14, 2011·4 cites·20 claims
- 2280US9610727B2Imprint lithographyASML NETHERLANDS BV·Filed 2014·Granted Apr 4, 2017·2 cites·19 claims
- 2379US7500218B2Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using sameASML NETHERLANDS BV·Filed 2004·Granted Mar 3, 2009·16 cites·29 claims
- 2479US5986269ACorrection device for correcting chromatic aberration in particle-optical apparatusPHILIPS CORP·Filed 1997·Granted Nov 16, 1999·35 cites·12 claims
- 2578US5578822AParticle-optical apparatus comprising a detector for secondary electronsPHILIPS CORP·Filed 1995·Granted Nov 26, 1996·34 cites·7 claims
- 2676US7023525B2Imaging apparatusASML NETHERLANDS BV·Filed 2004·Granted Apr 4, 2006·13 cites·39 claims
- 2773US5336885AElectron beam apparatusPHILIPS CORP·Filed 1992·Granted Aug 9, 1994·24 cites·18 claims
- 2872US8753557B2Imprint lithographyKRUIJT-STEGEMAN YVONNE WENDELA·Filed 2011·Granted Jun 17, 2014·1 cites·8 claims
- 2972US5300775AMethod of selecting a spatial energy spread within an electron beam, and an electron beam apparatus suitable for carrying out such a methodPHILIPS CORP·Filed 1993·Granted Apr 5, 1994·22 cites·18 claims
- 3071US6184525B1Environmental SEM with a multiple fields for improved secondary electron detectionPHILIPS ELECTRON OPTICS BV·Filed 1998·Granted Feb 6, 2001·23 cites·12 claims
- 3170US4306149AElectron microscope (comprising an auxiliary lens)PHILIPS CORP·Filed 1978·Granted Dec 15, 1981·14 cites·11 claims
- 3268US4823013ACharged particles exposure apparatus having an optically deformable beam bounding diaphragmPHILIPS CORP·Filed 1987·Granted Apr 18, 1989·14 cites·15 claims
- 3364US7167231B2Method and apparatus for printing large data flowsMICRONIC LASER SYSTEMS AB·Filed 2003·Granted Jan 23, 2007·7 cites·18 claims
- 3462US7403266B2Maskless lithography systems and methods utilizing spatial light modulator arraysASML HOLDING NV·Filed 2006·Granted Jul 22, 2008·1 cites·36 claims
- 3562US4095104AElectron microscopePHILIPS CORP·Filed 1976·Granted Jun 13, 1978·11 cites·7 claims
- 3660US4902930AElectron image projectorPHILIPS CORP·Filed 1988·Granted Feb 20, 1990·10 cites·7 claims
- 3759US6930755B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2002·Granted Aug 16, 2005·5 cites·19 claims
- 3857US7777861B2Methods, systems, and computer program products for printing patterns on photosensitive surfacesASML HOLDING NV·Filed 2007·Granted Aug 17, 2010·0 cites·20 claims
- 3955US11024481B2Scanning electron microscopePHENOM WORLD HOLDING B V·Filed 2020·Granted Jun 1, 2021·0 cites·9 claims
- 4055US4977324ACharged particle beam apparatusPHILIPS CORP·Filed 1989·Granted Dec 11, 1990·8 cites·19 claims
- 4152US6989920B2System and method for dose control in a lithographic systemASML HOLDING NV·Filed 2003·Granted Jan 24, 2006·2 cites·40 claims
- 4251US8848195B2Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrateLEEWIS CHRISTIAN MARINUS·Filed 2009·Granted Sep 30, 2014·0 cites·24 claims
- 4350US10580613B2Sample stagePHENOM WORLD HOLDING B V·Filed 2019·Granted Mar 3, 2020·0 cites·19 claims
- 4450US4871911AElectron beam apparatus comprising a semiconductor electron emitterPHILIPS CORP·Filed 1987·Granted Oct 3, 1989·7 cites·16 claims
- 4549US4789780AApparatus for energy-selective visualizationPHILIPS CORP·Filed 1987·Granted Dec 6, 1988·7 cites·13 claims
- 4648US7349068B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 25, 2008·1 cites·12 claims
- 4748US2012092636A1Metrology Apparatus, Lithography Apparatus and Method of Measuring a Property of a SubstrateVAN DER MAST KAREL DIEDERICK·Filed 2009·Application pending·0 cites
- 4847US7379579B2Imaging apparatusASML NETHERLANDS BV·Filed 2002·Granted May 27, 2008·1 cites·18 claims
- 4946US7102732B2Method of manufacturing a device by employing a lithographic apparatus including a sliding electron-optical elementAGERE SYST GUARDIAN CORP·Filed 2003·Granted Sep 5, 2006·0 cites·21 claims
- 5046US4820921AMethod of beam centeringPHILIPS CORP·Filed 1987·Granted Apr 11, 1989·6 cites·13 claims
Showing the top 50 of 54 patent records by PatentIndex Score.
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