Inventor

GANGULI SESHADRI

US95 patents

⚠️ This page may combine multiple inventors who share the name “GANGULI SESHADRI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

GANGULI SESHADRI

APPLIED MATERIALS INC

Apparatus for providing gas to a processing chamber

Method and apparatus of generating PDMAT precursor

Process for removing an underlying layer and depositing a barrier layer in one reactor

Copper interconnect barrier layer structure and formation method

Method of using a barrier sputter reactor to remove an underlying barrier layer

CVD method of depositing copper films by using improved organocopper precursor blend

Ruthenium layer formation for copper film deposition

Tantalum barrier layer for copper metallization

Method and apparatus for monitoring solid precursor delivery

Ruthenium as an underlayer for tungsten film deposition

Apparatus and process for plasma-enhanced atomic layer deposition

Method and apparatus for providing precursor gas to a processing chamber

Method and apparatus of generating PDMAT precursor

Multi-step barrier deposition method

Method and apparatus for providing precursor gas to a processing chamber

Deposition of tungsten nitride using plasma pretreatment in a chemical vapor deposition chamber

Ruthenium or cobalt as an underlayer for tungsten film deposition

Chemical precursor ampoule for vapor deposition processes

Chemical delivery apparatus for CVD or ALD

Method and apparatus for generating a precursor for a semiconductor processing system

Reduction of copper dewetting by transition metal deposition

Method for treating a deposited film for resistivity reduction

Ruthenium layer formation for copper film deposition

Selective deposition of aluminum oxide on metal surfaces

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

Post deposition treatments for CVD cobalt films

Method of recovering valuable material from exhaust gas stream of a reaction chamber

Chemical delivery apparatus for CVD or ALD

Chemical delivery apparatus for CVD or ALD

Cobalt deposition on barrier surfaces

Method for providing gas to a processing chamber

Apparatus and method for generating a chemical precursor

Selective deposition on non-metallic surfaces

Methods for filling features with ruthenium

Low thickness dependent work-function nMOS integration for metal gate

Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD)

Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof

Film deposition using spatial atomic layer deposition or pulsed chemical vapor deposition

Integrated platform for fabricating n-type metal oxide semiconductor (NMOS) devices

GANGULI SESHADRI

Process for forming cobalt-containing materials

NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors

Metal gate structures and methods for forming thereof

Process for forming cobalt and cobalt silicide materials in tungsten contact applications

Process for forming cobalt and cobalt silicide materials in tungsten contact applications

APPLIED MATERISALS INC

Apparatus and process for plasma-enhanced atomic layer deposition

LEE SANG-HYEOB

Formation of liner and barrier for tungsten as gate electrode and as contact plug to reduce resistance and enhance device performance

LU JIANG

Cobalt deposition on barrier surfaces

MA PAUL

Apparatus and process for plasma-enhanced atomic layer deposition

LEI YU

Post deposition treatments for CVD cobalt films

CHU SCHUBERT S

Ampoule with a thermally conductive coating