Inventor

KAWABE YASUMASA

JP49 patents

⚠️ This page may combine multiple inventors who share the name “KAWABE YASUMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KAWABE YASUMASA

FUJI PHOTO FILM CO LTD

Postive photoresist composition

Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent

Positive photosensitive resin composition

Positive-working photoresist composition

Positive photosensitive resin

Positive-working photoresist composition

Positive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredient

Positive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazide

Positive resist composition

Positive photoresist composition

Positive resin composition sensitive to ultraviolet rays

Positive photoresist composition

Positive photoresist composition

Positive working photoresist composition

Positive working photoresist composition

Positive-working photoresist composition

Positive-working o-quinone diazide photoresist composition

Positive photosensitive composition

Positive working photoresist composition

Positive photoresist composition

Process for synthesizing quinonediazide ester utilizing base catalyst

Positive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol group

Positive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compound

Positive type photoresist composition

Positive quinone diazide photoresist composition containing select polyhydroxy additive

Positive-working photoresist composition

Positive photoresist composition utilizing O-quinonediazide and novolak resin

Developer for positive type photoresists

Positive-working photoresist composition

Positive working photoresist composition

Positive photosensitive resin composition

Positive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution accelerator

Positive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalyst

Positive quinonediazide photoresist composition containing select hydroxyphenol additive

Presensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compound

Positive type quinonediazide photoresist composition containing select tetraphenolic additive

FUJIFILM CORP

Photosensitive transfer material, pattern formation method, and etching method

Positive resist composition

Positive photosensitive composition

Pattern forming method, etching method and method for producing capacitance-type input device

Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

TOKAI ELECTRO CHEMICAL CO

Method of low-temperature activation of peroxides

Method of dyeing fibrous products

Method of stabilizing an alkaline aqueous solution of thiourea dioxide

Dyeing method for fibrous products

OLIN MICROELECTRONIC CHEM INC

Positive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomers

ANDOU TAKESHI

Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern

STARLITE IND

Nanofiber dispersion, method of producing nanofiber dispersion, powdery nanofibers obtainable from the dispersion, resin composition containing the powdery nanofibers ad molding material for 3D printer using the resin composition