Positive type photoresist composition

Abstract

Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.

What is claimed is: 
     
       1. A positive type photoresist composition comprising an admixture of a 1,2-naphthoquinonediazido-5-(and/or -4-)-sulfonic ester of a polyhydroxy compound represented by the following formula (I), (II) or (III) and an alkali soluble resin: ##STR15## wherein R 1  to R 27 , which may be the same or different, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, a nitro group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, an aryloxyl group or an aralkoxy group; ##STR16## wherein R 31  to R 34 , which may be the same or different and in which the four groups for each of R 31  to R 34  may be the same or different, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group or an alkenyl group; R 35  and R 36  represents a hydrogen atom, an alkyl group or ##STR17## a and c each represents 0 or 1; and b ##STR18## wherein R 41  to R 45 , which may be the same or different, each represents a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group or an alkoxy group, with the proviso that at least one of R 41  to R 45  is a hydroxyl group; X represents a single bond or a --(CH 2 ) m  -- group; Y represents a --COO--X-- or --OCO--X-- group; Z represents an organic group having a valence of n; n represents an integer 3 to 6; and m represents n integer 1 to 4. 
     
     
       2. The positive type photoresist composition of claim 1, wherein the polyhydroxy compound is according to formula (I). 
     
     
       3. The positive type photoresist composition of claim 1, wherein the polyhydroxy compound is according to formula (II). 
     
     
       4. The positive type photoresist composition of claim 1, wherein the polyhydroxy compound is according to formula (III). 
     
     
       5. The positive type photoresist composition of claim 1, wherein the ester is present in an amount of 5 to 100 parts by weight based on 100 parts by weight of the alkali-soluble resin. 
     
     
       6. The positive type photoresist composition of claim 1, wherein the ester is present in an amount of 10 to 50 parts by weight based on 100 parts by weight of the alkali-soluble resin. 
     
     
       7. The positive type photoresist composition of claim 1 , wherein the ester is a 1 , 2-naphthoquinonediazide-4-sulfonic ester. 
     
     
       8. The positive type photoresist composition of claim 1 , wherein the ester is a 1 , 2-naphthoquinonediazide-5-sulfonic ester. 
     
     
       9. The positive type photoresist composition of claim 1, wherein the alkali-soluble resin ia a novolak resin.