Inventor · disambiguated record
Tadayoshi Kokubo
Also filed as: KOKUBO TADAYOSHI
33 granted patents·828 citations·filing 1982–1995
98Inventor score
Files withFUJI PHOTO FILM CO LTD33
Top patents by PatentIndex Score
33 records- 0197US5576143ALight-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 1992·Granted Nov 19, 1996·133 cites·11 claims
- 0295US5360692APositive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agentFUJI PHOTO FILM CO LTD·Filed 1993·Granted Nov 1, 1994·116 cites·9 claims
- 0392US5110709ALight-sensitive positive working composition containing a pisolfone compoundFUJI PHOTO FILM CO LTD·Filed 1991·Granted May 5, 1992·77 cites·15 claims
- 0489US4546075AHeat-developable photographic materialFUJI PHOTO FILM CO LTD·Filed 1983·Granted Oct 8, 1985·24 cites·31 claims
- 0586US4551424ASilver halide photographic light-sensitive materialFUJI PHOTO FILM CO LTD·Filed 1984·Granted Nov 5, 1985·22 cites·10 claims
- 0686US4452885AHeat-developable photographic materialFUJI PHOTO FILM CO LTD·Filed 1982·Granted Jun 5, 1984·20 cites·18 claims
- 0782US5707777ALight-sensitive compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jan 13, 1998·51 cites·2 claims
- 0879US5565300APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 15, 1996·34 cites·10 claims
- 0977US4592991ASilver halide photographic printing paperFUJI PHOTO FILM CO LTD·Filed 1984·Granted Jun 3, 1986·14 cites·13 claims
- 1073US4871645APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Oct 3, 1989·22 cites·12 claims
- 1172US5340686APositive-type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·26 cites·6 claims
- 1272US4863828APositive-working o-quinone diazide photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Sep 5, 1989·21 cites·7 claims
- 1371US5153096APositive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazideFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 6, 1992·25 cites·6 claims
- 1470US5389492AResist composition comprising a siloxane or silsesquioxane polymer having silanol groups in a composition with a naphthoquinone compoundFUJI PHOTO FILM CO LTD·Filed 1994·Granted Feb 14, 1995·32 cites·2 claims
- 1570US5290658APositive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredientFUJI PHOTO FILM CO LTD·Filed 1992·Granted Mar 1, 1994·23 cites·3 claims
- 1670US5173389APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1990·Granted Dec 22, 1992·24 cites·13 claims
- 1769US4657846ASilver halide photographic printing paperFUJI PHOTO FILM CO LTD·Filed 1984·Granted Apr 14, 1987·11 cites·19 claims
- 1865US4894311APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1987·Granted Jan 16, 1990·16 cites·8 claims
- 1962US4639416AInternal latent image-type silver halide emulsionFUJI PHOTO FILM CO LTD·Filed 1984·Granted Jan 27, 1987·9 cites·11 claims
- 2061US5340697ANegative type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·22 cites·4 claims
- 2160US5030550ADeveloper for positive type photoresistsFUJI PHOTO FILM CO LTD·Filed 1989·Granted Jul 9, 1991·13 cites·11 claims
- 2258US5089373APositive photoresist composition utilizing O-quinonediazide and novolak resinFUJI PHOTO FILM CO LTD·Filed 1989·Granted Feb 18, 1992·13 cites·9 claims
- 2355US5248582APositive-type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1992·Granted Sep 28, 1993·12 cites·7 claims
- 2454US5429905APositive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compoundFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jul 4, 1995·11 cites·7 claims
- 2549US5380618AMicropattern-forming material having a low molecular weight novolak resin, a quinone diazide sulfonyl ester and a solventFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jan 10, 1995·10 cites·7 claims
- 2648US5130224APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1990·Granted Jul 14, 1992·9 cites·10 claims
- 2747US5340688APositive type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·8 cites·9 claims
- 2845US5494773APositive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol groupFUJI PHOTO FILM CO LTD·Filed 1995·Granted Feb 27, 1996·9 cites·4 claims
- 2945US5324619APositive quinone diazide photoresist composition containing select polyhydroxy additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·7 cites·6 claims
- 3040US4842986APositively working resist materialFUJI PHOTO FILM CO LTD·Filed 1986·Granted Jun 27, 1989·7 cites·20 claims
- 3136US5576139APositive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalystFUJI PHOTO FILM CO LTD·Filed 1991·Granted Nov 19, 1996·3 cites·7 claims
- 3235US5318875APositive quinonediazide photoresist composition containing select hydroxyphenol additiveFUJI PHOTO FILM CO LTD·Filed 1993·Granted Jun 7, 1994·3 cites·5 claims
- 3331US5324618APositive type quinonediazide photoresist composition containing select tetraphenolic additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·1 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →