Inventor · disambiguated record
Yasumasa Kawabe
Also filed as: KAWABE YASUMASA · SATO KANJI
49 granted patents·864 citations·filing 1973–2017
98Inventor score
Files withFUJI PHOTO FILM CO LTD36FUJIFILM CORP6TOKAI ELECTRO CHEMICAL CO4ANDOU TAKESHI1OLIN MICROELECTRONIC CHEM INC1
Top patents by PatentIndex Score
49 records- 0195US5360692APositive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agentFUJI PHOTO FILM CO LTD·Filed 1993·Granted Nov 1, 1994·116 cites·9 claims
- 0293US5529881APostive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jun 25, 1996·108 cites·8 claims
- 0387US9810984B2Photosensitive transfer material, pattern formation method, and etching methodFUJIFILM CORP·Filed 2015·Granted Nov 7, 2017·2 cites·14 claims
- 0485US6376152B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Apr 23, 2002·24 cites·20 claims
- 0584US6596458B1Positive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2000·Granted Jul 22, 2003·58 cites·8 claims
- 0682US5707776APositive resin composition sensitive to ultraviolet raysFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jan 13, 1998·48 cites·13 claims
- 0782US4244690AMethod of dyeing fibrous productsTOKAI ELECTRO CHEMICAL CO·Filed 1979·Granted Jan 13, 1981·14 cites·5 claims
- 0877US5629128APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted May 13, 1997·38 cites·10 claims
- 0976US4197256AMethod of stabilizing an alkaline aqueous solution of thiourea dioxideTOKAI ELECTRO CHEMICAL CO·Filed 1979·Granted Apr 8, 1980·10 cites·5 claims
- 1073US4871645APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Oct 3, 1989·22 cites·12 claims
- 1172US4863828APositive-working o-quinone diazide photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1988·Granted Sep 5, 1989·21 cites·7 claims
- 1271US6806022B1Positive photosensitive resin compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Oct 19, 2004·24 cites·26 claims
- 1371US5153096APositive type photoresist composition comprising as a photosensitive ingredient a derivative of a triphenylmethane condensed with an o-quinone diazideFUJI PHOTO FILM CO LTD·Filed 1991·Granted Oct 6, 1992·25 cites·6 claims
- 1470US6692897B2Positive resist compositionFUJI PHOTO FILM CO LTD·Filed 2001·Granted Feb 17, 2004·25 cites·17 claims
- 1570US5609982APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1994·Granted Mar 11, 1997·22 cites·10 claims
- 1670US5290658APositive type photoresist composition comprising polyaromatic hydroxy quinone diazide esters as the photosensitive ingredientFUJI PHOTO FILM CO LTD·Filed 1992·Granted Mar 1, 1994·23 cites·3 claims
- 1767US8728716B2Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated patternANDOU TAKESHI·Filed 2012·Granted May 20, 2014·2 cites·16 claims
- 1867US6159656APositive photosensitive resinFUJI PHOTO FILM CO LTD·Filed 1999·Granted Dec 12, 2000·33 cites·16 claims
- 1965US10289001B2Pattern forming method, etching method and method for producing capacitance-type input deviceFUJIFILM CORP·Filed 2017·Granted May 14, 2019·0 cites·12 claims
- 2065US4894311APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1987·Granted Jan 16, 1990·16 cites·8 claims
- 2164US4240791ADyeing method for fibrous productsTOKAI ELECTRO CHEMICAL CO·Filed 1979·Granted Dec 23, 1980·6 cites·4 claims
- 2264US3948795AMethod of low-temperature activation of peroxidesTOKAI ELECTRO CHEMICAL CO·Filed 1973·Granted Apr 6, 1976·9 cites·7 claims
- 2360US6846610B2Positive photosensitive resin compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Jan 25, 2005·4 cites·21 claims
- 2460US5709977APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Jan 20, 1998·19 cites·7 claims
- 2560US5030550ADeveloper for positive type photoresistsFUJI PHOTO FILM CO LTD·Filed 1989·Granted Jul 9, 1991·13 cites·11 claims
- 2659US5674657APositive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomersOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Oct 7, 1997·18 cites·14 claims
- 2758US6743562B2Positive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 2002·Granted Jun 1, 2004·20 cites·12 claims
- 2858US5948587APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Sep 7, 1999·18 cites·7 claims
- 2958US5089373APositive photoresist composition utilizing O-quinonediazide and novolak resinFUJI PHOTO FILM CO LTD·Filed 1989·Granted Feb 18, 1992·13 cites·9 claims
- 3055US5652081APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1996·Granted Jul 29, 1997·15 cites·8 claims
- 3154US11566118B2Nanofiber dispersion, method of producing nanofiber dispersion, powdery nanofibers obtainable from the dispersion, resin composition containing the powdery nanofibers ad molding material for 3D printer using the resin compositionSTARLITE IND·Filed 2017·Granted Jan 31, 2023·0 cites·6 claims
- 3254US10133175B2Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging deviceFUJIFILM CORP·Filed 2016·Granted Nov 20, 2018·0 cites·25 claims
- 3354US5429905APositive working photoresist composition containing naphthoquinone diazide sulfonic acid ester of polyhydroxy compoundFUJI PHOTO FILM CO LTD·Filed 1994·Granted Jul 4, 1995·11 cites·7 claims
- 3452US7255971B2Positive resist compositionFUJIFILM CORP·Filed 2002·Granted Aug 14, 2007·3 cites·11 claims
- 3548US9599901B2Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging deviceFUJIFILM CORP·Filed 2016·Granted Mar 21, 2017·0 cites·15 claims
- 3648US5130224APositive-working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1990·Granted Jul 14, 1992·9 cites·10 claims
- 3747US5340688APositive type photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·8 cites·9 claims
- 3846US7214465B2Positive photosensitive compositionFUJIFILM CORP·Filed 2003·Granted May 8, 2007·6 cites·11 claims
- 3946US6699635B1Positive photosensitive compositionFUJI PHOTO FILM CO LTD·Filed 1999·Granted Mar 2, 2004·9 cites·13 claims
- 4046US5523396AProcess for synthesizing quinonediazide ester utilizing base catalystFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jun 4, 1996·9 cites·2 claims
- 4145US5494773APositive photoresist composition comprising a novolak resin having a cycloalkylidene-bisphenol groupFUJI PHOTO FILM CO LTD·Filed 1995·Granted Feb 27, 1996·9 cites·4 claims
- 4245US5324619APositive quinone diazide photoresist composition containing select polyhydroxy additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·7 cites·6 claims
- 4342US5554481APositive working photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1994·Granted Sep 10, 1996·7 cites·10 claims
- 4442US5534382APositive photoresist compositionFUJI PHOTO FILM CO LTD·Filed 1995·Granted Jul 9, 1996·7 cites·6 claims
- 4538US5620828APositive photoresist composition containing quinonediazide esterification product, novolak resin and pocyhydroxy alkali dissolution acceleratorFUJI PHOTO FILM CO LTD·Filed 1995·Granted Apr 15, 1997·5 cites·3 claims
- 4636US5576139APositive type photoresist composition comprising a novolak resin made with a silica-magnesia solid catalystFUJI PHOTO FILM CO LTD·Filed 1991·Granted Nov 19, 1996·3 cites·7 claims
- 4736US5340683APresensitized plate having surface-grained and anodized aluminum substrate with light-sensitive layer containing quinone diazide sulfonic acid ester of particular polyhydroxy compoundFUJI PHOTO FILM CO LTD·Filed 1993·Granted Aug 23, 1994·1 cites·9 claims
- 4835US5318875APositive quinonediazide photoresist composition containing select hydroxyphenol additiveFUJI PHOTO FILM CO LTD·Filed 1993·Granted Jun 7, 1994·3 cites·5 claims
- 4931US5324618APositive type quinonediazide photoresist composition containing select tetraphenolic additiveFUJI PHOTO FILM CO LTD·Filed 1992·Granted Jun 28, 1994·1 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →