Inventor · disambiguated record
Jason Bloking
Also filed as: BLOKING JASON · BLOKING JASON T · BLOKING JASON THOMAS
9 granted patents·5 pending applications·830 citations·filing 2002–2012
90Inventor score
Top patents by PatentIndex Score
14 records- 0198US7338734B2Conductive lithium storage electrodeMASSACHUSETTS INST TECHNOLOGY·Filed 2002·Granted Mar 4, 2008·216 cites·132 claims
- 0298US7109114B2HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performanceAPPLIED MATERIALS INC·Filed 2004·Granted Sep 19, 2006·515 cites·17 claims
- 0395US7524750B2Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVDAPPLIED MATERIALS INC·Filed 2006·Granted Apr 28, 2009·55 cites·21 claims
- 0491US8148013B2Conductive lithium storage electrodeCHIANG YET-MING·Filed 2007·Granted Apr 3, 2012·11 cites·85 claims
- 0591US7745350B2Impurity control in HDP-CVD DEP/ETCH/DEP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·13 cites·12 claims
- 0690US8852807B2Conductive lithium storage electrodeCHIANG YET-MING·Filed 2012·Granted Oct 7, 2014·5 cites·41 claims
- 0782US7651587B2Two-piece dome with separate RF coils for inductively coupled plasma reactorsAPPLIED MATERIALS INC·Filed 2005·Granted Jan 26, 2010·8 cites·15 claims
- 0880US7867921B2Reduction of etch-rate drift in HDP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jan 11, 2011·7 cites·19 claims
- 0949US2006219169A1Hdp-cvd seasoning process for high power hdp-cvd gapfil to improve particle performanceAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 1045US2008299775A1Gapfill extension of hdp-cvd integrated process modulation sio2 processAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1144US2006075967A1Magnetic-field concentration in inductively coupled plasma reactorsAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 1244US2006177600A1Inductive plasma system with sidewall magnetAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 1343US2008142483A1Multi-step dep-etch-dep high density plasma chemical vapor deposition processes for dielectric gapfillsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1442US9246106B2Electron deficient molecules and their use in organic electronic applicationsSELLINGER ALAN·Filed 2012·Granted Jan 26, 2016·0 cites·11 claims
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