Inventor · disambiguated record
Johannes Ruoff
Also filed as: RUOFF JOHANNES
38 granted patents·8 pending applications·96 citations·filing 2005–2025
96Inventor score
Top patents by PatentIndex Score
46 records- 0193US10068325B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Sep 4, 2018·10 cites·20 claims
- 0290US10606048B2Imaging optical unit for a metrology system for examining a lithography maskZEISS CARL SMT GMBH·Filed 2017·Granted Mar 31, 2020·3 cites·21 claims
- 0390US10048592B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2017·Granted Aug 14, 2018·4 cites·22 claims
- 0490US9535332B2Mask for EUV lithography, EUV lithography system and method for optimising the imaging of a maskZEISS CARL SMT GMBH·Filed 2012·Granted Jan 3, 2017·6 cites·30 claims
- 0589US9551941B2Illumination system for an EUV lithography device and facet mirror thereforZEISS CARL SMT GMBH·Filed 2015·Granted Jan 24, 2017·4 cites·24 claims
- 0689US9041908B2Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the maskRUOFF JOHANNES·Filed 2012·Granted May 26, 2015·8 cites·24 claims
- 0788US9645503B2CollectorZEISS CARL SMT GMBH·Filed 2014·Granted May 9, 2017·5 cites·22 claims
- 0888US8681184B2Display unit, and displaying method for the binocular representation of a multicolor imageSEESSELBERG MARKUS·Filed 2008·Granted Mar 25, 2014·21 cites·14 claims
- 0987US9625827B2Imaging optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2015·Granted Apr 18, 2017·5 cites·14 claims
- 1082US9678439B2MirrorZEISS CARL SMT GMBH·Filed 2015·Granted Jun 13, 2017·3 cites·23 claims
- 1181US8674329B2Method and apparatus for analyzing and/or repairing of an EUV mask defectBUDACH MICHAEL·Filed 2011·Granted Mar 18, 2014·4 cites·10 claims
- 1281US7408712B2Polarization-selectively blazed, diffractive optical elementZEISS CARL AG·Filed 2005·Granted Aug 5, 2008·6 cites·23 claims
- 1380US11817231B2Detection system for X-ray inspection of an objectZEISS CARL SMT GMBH·Filed 2021·Granted Nov 14, 2023·1 cites·26 claims
- 1480US10386297B2Method and apparatus for examining an element of a photolithographic mask for the EUV rangeZEISS CARL SMT GMBH·Filed 2017·Granted Aug 20, 2019·2 cites·20 claims
- 1579US11119413B2Imaging optical unit for imaging an object field into an image fieldZEISS CARL SMT GMBH·Filed 2020·Granted Sep 14, 2021·1 cites·19 claims
- 1678US2024152057A1Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1775US10345570B2Device for optical examination of a specimen, method for examining a specimen and method for transferring a device into an operation-ready stateZEISS CARL MICROSCOPY GMBH·Filed 2016·Granted Jul 9, 2019·2 cites·47 claims
- 1872US10634886B2Method for three-dimensionally measuring a 3D aerial image of a lithography maskZEISS CARL SMT GMBH·Filed 2018·Granted Apr 28, 2020·1 cites·6 claims
- 1972US2025216792A1Method for operating a projection exposure systemZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 2071US9658533B2Arrangement of a mirrorZEISS CARL SMT GMBH·Filed 2014·Granted May 23, 2017·2 cites·19 claims
- 2170US11914303B2Apparatus and method for characterizing a microlithographic maskZEISS CARL SMT GMBH·Filed 2021·Granted Feb 27, 2024·0 cites·17 claims
- 2270US9955563B2EUV light source for generating a usable output beam for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Apr 24, 2018·2 cites·20 claims
- 2369US9835953B2Imaging optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Dec 5, 2017·1 cites·20 claims
- 2469US2025146958A1X-ray inspection system for inspection of an objectZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2567US12040103B2Imaging optical arrangement to image an object illuminated by X-raysZEISS CARL SMT GMBH·Filed 2021·Granted Jul 16, 2024·0 cites·18 claims
- 2667US9507269B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Nov 29, 2016·1 cites·22 claims
- 2766US2024295507A1Imaging optical arrangement to image an object illuminated by x-raysZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2864US11927500B2Method and device for characterizing the surface shape of an optical elementZEISS CARL SMT GMBH·Filed 2022·Granted Mar 12, 2024·0 cites·24 claims
- 2964US8126669B2Optimization and matching of optical systems by use of orientation Zernike polynomialsTOTZECK MICHAEL·Filed 2009·Granted Feb 28, 2012·4 cites·20 claims
- 3060US10591825B2Projection lens, projection exposure apparatus and projection exposure method for EUV microlithographyZEISS CARL SMT GMBH·Filed 2018·Granted Mar 17, 2020·0 cites·30 claims
- 3160US10191386B2Imaging optical unit for EUV projection lithographyZEISS CARL SMT GMBH·Filed 2017·Granted Jan 29, 2019·0 cites·14 claims
- 3258US11422470B2Imaging optical unit for EUV microlithographyZEISS CARL SMT GMBH·Filed 2020·Granted Aug 23, 2022·0 cites·20 claims
- 3357US11137688B2Optical system for transferring original structure portions of a lithography mask, projection optical unit for imaging an object field in which at least one original structure portion of the lithography mask is arrangeable, and lithography maskZEISS CARL SMT GMBH·Filed 2020·Granted Oct 5, 2021·0 cites·19 claims
- 3454US2023221571A1Optical system, in particular for characterizing a microlithography maskZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 3553US9798249B2Method and apparatus for compensating at least one defect of an optical systemZEISS CARL SMS LTD·Filed 2014·Granted Oct 24, 2017·0 cites·20 claims
- 3652US10274649B2Mirror and related EUV systems and methodsZEISS CARL SMT GMBH·Filed 2013·Granted Apr 30, 2019·0 cites·20 claims
- 3752US9639005B2Imaging catoptric EUV projection optical unitZEISS CARL SMT GMBH·Filed 2014·Granted May 2, 2017·0 cites·20 claims
- 3851US2025239494A1Method to obtain information to control a manufacturing process for a stacked semiconductor device and detection system using such methodZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 3950US11935228B2Method to acquire a 3D image of a sample structureZEISS CARL SMT GMBH·Filed 2021·Granted Mar 19, 2024·0 cites·26 claims
- 4050US2015234289A1Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the maskZEISS CARL SMT GMBH·Filed 2015·Application pending·0 cites
- 4149US9785052B2Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errorsZEISS CARL SMT GMBH·Filed 2013·Granted Oct 10, 2017·0 cites·20 claims
- 4247US2010026978A1Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 4346US9500956B2Optical system of a microlithographic projection exposure apparatus, and microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Nov 22, 2016·0 cites·18 claims
- 4446US7679831B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Mar 16, 2010·0 cites·20 claims
- 4544US9298097B2Projection exposure apparatus for EUV microlithography and method for microlithographic exposureZEISS CARL SMT GMBH·Filed 2013·Granted Mar 29, 2016·0 cites·24 claims
- 4640US9933710B2Projection exposure method and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2017·Granted Apr 3, 2018·0 cites·20 claims
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