Inventor · disambiguated record
Phillip Brock
Also filed as: BROCK PHILLIP · BROCK PHILLIP J · BROCK PHILLIP JOE
60 granted patents·6 pending applications·1,307 citations·filing 1975–2015
99Inventor score
Top patents by PatentIndex Score
66 records- 0198US7393624B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 1, 2008·57 cites·20 claims
- 0297US7563558B2Negative resists based on acid-catalyzed elimination of polar moleculesIBM·Filed 2007·Granted Jul 21, 2009·34 cites·16 claims
- 0397US5658734AProcess for synthesizing chemical compoundsIBM·Filed 1995·Granted Aug 19, 1997·306 cites·15 claims
- 0496US6806026B2Photoresist compositionIBM·Filed 2002·Granted Oct 19, 2004·62 cites·69 claims
- 0596US6730454B2Antireflective SiO-containing compositions for hardmask layerIBM·Filed 2002·Granted May 4, 2004·112 cites·11 claims
- 0695US7678537B2Graded topcoat materials for immersion lithographyIBM·Filed 2008·Granted Mar 16, 2010·44 cites·19 claims
- 0795US6610456B2Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositionsIBM·Filed 2001·Granted Aug 26, 2003·57 cites·56 claims
- 0895US6548219B2Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositionsIBM·Filed 2001·Granted Apr 15, 2003·67 cites·31 claims
- 0994US6509134B2Norbornene fluoroacrylate copolymers and process for the use thereofIBM·Filed 2001·Granted Jan 21, 2003·83 cites·20 claims
- 1092US7709370B2Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structuresIBM·Filed 2007·Granted May 4, 2010·22 cites·13 claims
- 1192US7300739B2Negative resists based on a acid-catalyzed elimination of polar moleculesIBM·Filed 2003·Granted Nov 27, 2007·33 cites·27 claims
- 1292US6653048B2High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2002·Granted Nov 25, 2003·30 cites·25 claims
- 1392US6444408B1High silicon content monomers and polymers suitable for 193 nm bilayer resistsIBM·Filed 2000·Granted Sep 3, 2002·35 cites·26 claims
- 1490US8029971B2Photopatternable dielectric materials for BEOL applications and methods for useIBM·Filed 2008·Granted Oct 4, 2011·11 cites·24 claims
- 1590US7288362B2Immersion topcoat materials with improved performanceIBM·Filed 2005·Granted Oct 30, 2007·11 cites·25 claims
- 1689US8541477B2Methods of depolymerizing terephthalate polyestersALABDULRAHMAN ABDULLAH M·Filed 2011·Granted Sep 24, 2013·15 cites·38 claims
- 1789US7358029B2Low activation energy dissolution modification agents for photoresist applicationsIBM·Filed 2005·Granted Apr 15, 2008·9 cites·31 claims
- 1888US6818381B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2001·Granted Nov 16, 2004·21 cites·11 claims
- 1985US4393174ABase hydrolysis of pendant amide polymersDYNAPOL CORP·Filed 1981·Granted Jul 12, 1983·33 cites·10 claims
- 2082US7135595B2Photoresist compositionIBM·Filed 2006·Granted Nov 14, 2006·4 cites·1 claims
- 2182US6677419B1Preparation of copolymersIBM·Filed 2002·Granted Jan 13, 2004·18 cites·21 claims
- 2282US6251560B1Photoresist compositions with cyclic olefin polymers having lactone moietyIBM·Filed 2000·Granted Jun 26, 2001·20 cites·31 claims
- 2381US7521172B2Topcoat material and use thereof in immersion lithography processesIBM·Filed 2006·Granted Apr 21, 2009·7 cites·17 claims
- 2478US8389663B2Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereofBROCK PHILLIP JOE·Filed 2009·Granted Mar 5, 2013·5 cites·27 claims
- 2578US7919225B2Photopatternable dielectric materials for BEOL applications and methods for useIBM·Filed 2008·Granted Apr 5, 2011·15 cites·19 claims
- 2677US6927015B2Underlayer compositions for multilayer lithographic processesIBM·Filed 2004·Granted Aug 9, 2005·10 cites·5 claims
- 2776US7014980B2Photoresist compositionIBM·Filed 2004·Granted Mar 21, 2006·10 cites·29 claims
- 2876US5362584APhase-shifting transparent lithographic mask for writing contiguous structures from noncontiguous mask areasIBM·Filed 1993·Granted Nov 8, 1994·34 cites·6 claims
- 2975US8440387B2Graded topcoat materials for immersion lithographyALLEN ROBERT D·Filed 2010·Granted May 14, 2013·6 cites·20 claims
- 3075US4016223AProstaglandin dehydrogenase inhibiting agentsNELSON RES & DEV·Filed 1975·Granted Apr 5, 1977·10 cites·2 claims
- 3174US7944055B2Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structuresIBM·Filed 2010·Granted May 17, 2011·3 cites·11 claims
- 3273US8470516B2Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articlesALLEN ROBERT D·Filed 2009·Granted Jun 25, 2013·3 cites·17 claims
- 3373US7193023B2Low activation energy photoresistsIBM·Filed 2003·Granted Mar 20, 2007·11 cites·56 claims
- 3472US7867689B2Method of use for photopatternable dielectric materials for BEOL applicationsIBM·Filed 2007·Granted Jan 11, 2011·3 cites·21 claims
- 3570US8946371B2Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereofIBM·Filed 2013·Granted Feb 3, 2015·1 cites·23 claims
- 3670US8431670B2Photo-patternable dielectric materials and formulations and methods of useALLEN ROBERT DAVID·Filed 2009·Granted Apr 30, 2013·2 cites·24 claims
- 3769US9006373B2Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereofIBM·Filed 2013·Granted Apr 14, 2015·1 cites·10 claims
- 3869US7209324B2Sliders bonded by a debondable encapsulant containing styrene and butadiene polymersHITACHI GLOBAL STORAGE NETHERL·Filed 2003·Granted Apr 24, 2007·7 cites·17 claims
- 3968US7951524B2Self-topcoating photoresist for photolithographyIBM·Filed 2008·Granted May 31, 2011·3 cites·26 claims
- 4067US7309754B2Stable encapsulant fluid capable of undergoing reversible Diels-Alder polymerizationHITACHI GLOBAL STORAGE TECH·Filed 2003·Granted Dec 18, 2007·6 cites·19 claims
- 4165US8945808B2Self-topcoating resist for photolithographyDAVID ROBERT ALLEN·Filed 2006·Granted Feb 3, 2015·3 cites·16 claims
- 4262US6730452B2Lithographic photoresist composition and process for its useIBM·Filed 2001·Granted May 4, 2004·17 cites·60 claims
- 4360US6770419B2Low silicon-outgassing resist for bilayer lithographyIBM·Filed 2002·Granted Aug 3, 2004·14 cites·7 claims
- 4459US7064929B2Sliders bonded by a debondable encapsulant containing styrene and acrylate polymersHITACHI GLOBAL STORAGE NETHERL·Filed 2003·Granted Jun 20, 2006·3 cites·19 claims
- 4558US8802347B2Silicon containing coating compositions and methods of useALLEN ROBERT D·Filed 2009·Granted Aug 12, 2014·0 cites·20 claims
- 4657US9012587B2Photo-patternable dielectric materials and formulations and methods of useIBM·Filed 2013·Granted Apr 21, 2015·0 cites·11 claims
- 4757US4775608AGeneration of capacitive servo patterns on magnetic storage disksIBM·Filed 1987·Granted Oct 4, 1988·10 cites·4 claims
- 4856US4038415AProstaglandin dehydrogenase inhibiting agentsNELSON RES & DEV·Filed 1976·Granted Jul 26, 1977·11 cites·12 claims
- 4954US6074800APhoto acid generator compounds, photo resists, and method for improving biasIBM·Filed 1998·Granted Jun 13, 2000·16 cites·9 claims
- 5054US2008311530A1Graded topcoat materials for immersion lithographyALLEN ROBERT D·Filed 2007·Application pending·0 cites
Showing the top 50 of 66 patent records by PatentIndex Score.
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