Inventor · disambiguated record
Vedapuram S. Achutharaman
Also filed as: ACHUTHARAMAN VEDAPURAM · ACHUTHARAMAN VEDAPURAM S
23 granted patents·5 pending applications·378 citations·filing 1996–2023
96Inventor score
Files withAPPLIED MATERIALS INC21YOKOTA YOSHITAKA2ACHUTHARAMAN VEDAPURAM S1JENNINGS DEAN1RANISH JOSEPH M1
Top patents by PatentIndex Score
28 records- 0197US12195839B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2023·Granted Jan 14, 2025·1 cites·20 claims
- 0297US9725799B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2014·Granted Aug 8, 2017·15 cites·15 claims
- 0396US8288683B2Fast axis beam profile shaping for high power laser diode based annealing systemJENNINGS DEAN·Filed 2008·Granted Oct 16, 2012·34 cites·24 claims
- 0495USD797691SComposite edge ringAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·59 cites·1 claims
- 0593US7972441B2Thermal oxidation of silicon using ozoneAPPLIED MATERIALS INC·Filed 2005·Granted Jul 5, 2011·22 cites·7 claims
- 0692US9797037B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 24, 2017·2 cites·9 claims
- 0788US7674999B2Fast axis beam profile shaping by collimation lenslets for high power laser diode based annealing systemAPPLIED MATERIALS INC·Filed 2006·Granted Mar 9, 2010·11 cites·16 claims
- 0888US6888104B1Thermally matched support ring for substrate processing chamberAPPLIED MATERIALS INC·Filed 2004·Granted May 3, 2005·41 cites·25 claims
- 0987US6019839AMethod and apparatus for forming an epitaxial titanium silicide film by low pressure chemical vapor depositionAPPLIED MATERIALS INC·Filed 1998·Granted Feb 1, 2000·73 cites·13 claims
- 1086US8409353B2Water cooled gas injectorYOKOTA YOSHITAKA·Filed 2011·Granted Apr 2, 2013·6 cites·15 claims
- 1181US6916744B2Method and apparatus for planarization of a material by growing a sacrificial film with customized thickness profileAPPLIED MATERIALS INC·Filed 2002·Granted Jul 12, 2005·27 cites·19 claims
- 1280US7964418B2Real time process monitoring and control for semiconductor junctionsSOLYNDRA LLC·Filed 2007·Granted Jun 21, 2011·6 cites·42 claims
- 1379US8110828B2Real time process monitoring and control for semiconductor junctionsACHUTHARAMAN VEDAPURAM S·Filed 2011·Granted Feb 7, 2012·4 cites·42 claims
- 1475US7241345B2Cylinder for thermal processing chamberAPPLIED MATERIALS INC·Filed 2003·Granted Jul 10, 2007·17 cites·17 claims
- 1574US11566318B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2017·Granted Jan 31, 2023·0 cites·14 claims
- 1671US11566319B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2017·Granted Jan 31, 2023·0 cites·11 claims
- 1770US11566317B2Ion beam sputtering with ion assisted deposition for coatings on chamber componentsAPPLIED MATERIALS INC·Filed 2017·Granted Jan 31, 2023·0 cites·17 claims
- 1868US5863598AMethod of forming doped silicon in high aspect ratio openingsAPPLIED MATERIALS INC·Filed 1996·Granted Jan 26, 1999·36 cites·20 claims
- 1962US6022587AMethod and apparatus for improving film deposition uniformity on a substrateAPPLIED MATERIALS INC·Filed 1997·Granted Feb 8, 2000·20 cites·20 claims
- 2054US10109464B2Minimization of ring erosion during plasma processesAPPLIED MATERIALS INC·Filed 2016·Granted Oct 23, 2018·0 cites·19 claims
- 2154US2019043697A1Minimization of ring erosion during plasma processesAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2253US2007026693A1Method of Thermally Oxidizing Silicon Using OzoneAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2352US8497193B2Method of thermally treating silicon with oxygenYOKOTA YOSHITAKA·Filed 2011·Granted Jul 30, 2013·0 cites·21 claims
- 2444US2008090309A1Controlled annealing methodRANISH JOSEPH M·Filed 2007·Application pending·0 cites
- 2540US11049760B2Universal process kitAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·0 cites·20 claims
- 2637US2006240680A1Substrate processing platform allowing processing in different ambientsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2735US6284650B1Integrated tungsten-silicide processesAPPLIED MATERIALS INC·Filed 1997·Granted Sep 4, 2001·4 cites·17 claims
- 2830US2002020358A1Method and apparatus for improving film deposition uniformity on a substrateFiled 1999·Application pending·0 cites
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