Inventor · disambiguated record
Kunal N. Taravade
Also filed as: TARAVADE KUNAL · TARAVADE KUNAL N
28 granted patents·4 pending applications·621 citations·filing 1998–2008
97Inventor score
Top patents by PatentIndex Score
32 records- 0193US6441419B1Encapsulated-metal vertical-interdigitated capacitor and damascene method of manufacturing sameLSI LOGIC CORP·Filed 2000·Granted Aug 27, 2002·91 cites·20 claims
- 0291US6261406B1Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surfaceLSI LOGIC CORP·Filed 1999·Granted Jul 17, 2001·64 cites·26 claims
- 0388US6775818B2Device parameter and gate performance simulation based on wafer image predictionLSI LOGIC CORP·Filed 2002·Granted Aug 10, 2004·57 cites·26 claims
- 0485US7966582B2Method and apparatus for modeling long-range EUVL flareSYNOPSYS INC·Filed 2008·Granted Jun 21, 2011·9 cites·20 claims
- 0584US6251740B1Method of forming and electrically connecting a vertical interdigitated metal-insulator-metal capacitor extending between interconnect layers in an integrated circuitLSI LOGIC CORP·Filed 1998·Granted Jun 26, 2001·77 cites·59 claims
- 0682US6417535B1Vertical interdigitated metal-insulator-metal capacitor for an integrated circuitLSI LOGIC CORP·Filed 1998·Granted Jul 9, 2002·68 cites·22 claims
- 0782US6277707B1Method of manufacturing semiconductor device having a recessed gate structureLSI LOGIC CORP·Filed 1998·Granted Aug 21, 2001·58 cites·28 claims
- 0878US6852243B2Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surfaceLSI LOGIC CORP·Filed 2001·Granted Feb 8, 2005·12 cites·12 claims
- 0976US6864020B1Chromeless phase shift mask using non-linear optical materialsLSI LOGIC CORP·Filed 2002·Granted Mar 8, 2005·13 cites·20 claims
- 1070US6074517AMethod and apparatus for detecting an endpoint polishing layer by transmitting infrared light signals through a semiconductor waferLSI LOGIC CORP·Filed 1998·Granted Jun 13, 2000·37 cites·16 claims
- 1167US6303899B1Method and apparatus for scribing a code in an inactive outer clear out area of a semiconductor waferLSI LOGIC CORP·Filed 1998·Granted Oct 16, 2001·33 cites·16 claims
- 1263US8015540B2Method and system for reducing inter-layer capacitance in integrated circuitsLSI CORP·Filed 2008·Granted Sep 6, 2011·2 cites·6 claims
- 1363US6699766B1Method of fabricating an integral capacitor and gate transistor having nitride and oxide polish stop layers using chemical mechanical polishing eliminationLSI LOGIC CORP·Filed 2002·Granted Mar 2, 2004·7 cites·11 claims
- 1460US6549322B1Method and apparatus for enhancing image contrast using intensity filtrationLSI LOGIC CORP·Filed 2000·Granted Apr 15, 2003·4 cites·2 claims
- 1558US7149340B2Mask defect analysis for both horizontal and vertical processing effectsLSI LOGIC CORP·Filed 2002·Granted Dec 12, 2006·12 cites·26 claims
- 1656US7148146B1Method of fabricating an integral capacitor and gate transistor having nitride and oxide polish stop layers using chemical mechanical polishing eliminationLSI LOGIC CORP·Filed 2003·Granted Dec 12, 2006·4 cites·5 claims
- 1755US6288773B2Method and apparatus for removing residual material from an alignment mark of a semiconductor waferLSI LOGIC CORP·Filed 1998·Granted Sep 11, 2001·14 cites·25 claims
- 1852US7396760B2Method and system for reducing inter-layer capacitance in integrated circuitsLSI CORP·Filed 2004·Granted Jul 8, 2008·4 cites·19 claims
- 1952US6174407B1Apparatus and method for detecting an endpoint of an etching process by transmitting infrared light signals through a semiconductor waferLSI LOGIC CORP·Filed 1998·Granted Jan 16, 2001·17 cites·14 claims
- 2051US6285035B1Apparatus for detecting an endpoint polishing layer of a semiconductor wafer having a wafer carrier with independent concentric sub-carriers and associated methodLSI LOGIC CORP·Filed 1998·Granted Sep 4, 2001·16 cites·28 claims
- 2150US2006188793A1Adjustable Transmission Phase Shift MaskLSI LOGIC CORP·Filed 2006·Application pending·0 cites
- 2248US6970622B1Arrangement and method for controlling the transmission of a light signal based on intensity of a received light signalLSI LOGIC CORP·Filed 2001·Granted Nov 29, 2005·2 cites·21 claims
- 2346US6120607AApparatus and method for blocking the deposition of oxide on a waferLSI LOGIC CORP·Filed 1998·Granted Sep 19, 2000·12 cites·20 claims
- 2443US7067223B2Adjustable transmission phase shift maskLSI LOGIC CORP·Filed 2004·Granted Jun 27, 2006·0 cites·12 claims
- 2543US7033710B2Method and apparatus for enhancing image contrast using intensity filtrationLSI LOGIC CORP·Filed 2003·Granted Apr 25, 2006·0 cites·9 claims
- 2641US6271911B2Apparatus for enhancing image contrast using intensity filtrationLSI LOGIC CORP·Filed 2000·Granted Aug 7, 2001·0 cites·9 claims
- 2741US6225215B1Method for enhancing anti-reflective coatings used in photolithography of electronic devicesLSI LOGIC CORP·Filed 1999·Granted May 1, 2001·8 cites·26 claims
- 2839US6841308B1Adjustable transmission phase shift maskLSI LOGIC CORP·Filed 2001·Granted Jan 11, 2005·0 cites·6 claims
- 2938US2001042874A1Semiconductor device having a recessed gate structure and method of manufacturing the sameFiled 2001·Application pending·0 cites
- 3037US2005014075A1Phase edge darkening binary masksFiled 2003·Application pending·0 cites
- 3136US2005019673A1Attenuated film with etched quartz phase shift maskFiled 2003·Application pending·0 cites
- 3235US6527867B1Method for enhancing anti-reflective coatings used in photolithography of electronic devicesLSI LOGIC CORP·Filed 2000·Granted Mar 4, 2003·0 cites·6 claims
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