Inventor · disambiguated record
Shuuichi Nishikido
Also filed as: NISHIKIDO SHUUICHI
14 granted patents·1 pending application·173 citations·filing 1997–2022
92Inventor score
Top patents by PatentIndex Score
15 records- 0190US8578953B2Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage mediumTAKIGUCHI YASUSHI·Filed 2007·Granted Nov 12, 2013·17 cites·21 claims
- 0286US6551400B2Coating apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Apr 22, 2003·21 cites·7 claims
- 0386US6228561B1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 1997·Granted May 8, 2001·36 cites·17 claims
- 0484US9716002B2Substrate cleaning methodTOKYO ELECTRON LTD·Filed 2016·Granted Jul 25, 2017·3 cites·15 claims
- 0584US6503003B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jan 7, 2003·19 cites·5 claims
- 0680US6402399B2Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Jun 11, 2002·15 cites·7 claims
- 0779US7431038B2Wet processing device and wet processing methodTOKYO ELECTRON LTD·Filed 2005·Granted Oct 7, 2008·7 cites·17 claims
- 0877US6241403B1Developing method and developing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 5, 2001·34 cites·7 claims
- 0972US7766566B2Developing treatment apparatus and developing treatment methodTOKYO ELECTRON LTD·Filed 2006·Granted Aug 3, 2010·4 cites·28 claims
- 1072US7419316B2Developing treatment apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Sep 2, 2008·4 cites·27 claims
- 1168US11865590B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2022·Granted Jan 9, 2024·0 cites·4 claims
- 1267US7387455B2Substrate processing device, substrate processing method, and developing deviceTOKYO ELECTRON LTD·Filed 2003·Granted Jun 17, 2008·13 cites·50 claims
- 1358US11504751B2Substrate cleaning method, processing container cleaning method, and substrate processing deviceTOKYO ELECTRON LTD·Filed 2019·Granted Nov 22, 2022·0 cites·4 claims
- 1453US2014102474A1Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 1533US11084072B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Aug 10, 2021·0 cites·5 claims
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