Inventor · disambiguated record
Yao-Hwan Kao
Also filed as: KAO YAO-HWAN
17 granted patents·9 pending applications·312 citations·filing 1997–2025
92Inventor score
Top patents by PatentIndex Score
26 records- 0195US9536759B2Baking apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jan 3, 2017·168 cites·20 claims
- 0295US8580117B2System and method for replacing resist filter to reduce resist filter-induced wafer defectsKAO YAO-HWAN·Filed 2007·Granted Nov 12, 2013·97 cites·5 claims
- 0385US9855579B2Spin dispenser module substrate surface protection systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jan 2, 2018·7 cites·20 claims
- 0480US2024295810A1Method and system for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0577US2025329541A1Method and system for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0672US11806743B2Spin dispenser module substrate surface protection systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 7, 2023·0 cites·20 claims
- 0772US9081306B2Method of optimizing lithography tools utilizationTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Jul 14, 2015·2 cites·20 claims
- 0871US12019370B2Method and system for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
- 0970US12400866B2Method and system for manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 26, 2025·0 cites·20 claims
- 1068US9375665B2System and method for replacing resist filter to reduce resist filter-induced wafer defectsTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 28, 2016·1 cites·20 claims
- 1166US6723168B2Spin-coater with self-cleaning cup and method of usingTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Apr 20, 2004·11 cites·8 claims
- 1265US9793143B2Semiconductor processing apparatus and method of operating the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Oct 17, 2017·2 cites·19 claims
- 1360US7789576B2PEB embedded exposure apparatusTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Sep 7, 2010·1 cites·18 claims
- 1458US2024429067A1Dynamic exhaust for chemical processingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1555US11344910B2Spin dispenser module substrate surface protection systemTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted May 31, 2022·0 cites·20 claims
- 1651US2020171623A1Wafer backside cleaning apparatus and method of cleaning wafer backsideTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Application pending·0 cites
- 1750US7026580B2Adjustable exhaust flow for thermal uniformityTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Apr 11, 2006·2 cites·15 claims
- 1846US6927363B1Distribution manifold for exhausting photoresist vaporsTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Aug 9, 2005·4 cites·16 claims
- 1943US5857590AControlled multi-nozzle liquid dispensing systemTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jan 12, 1999·17 cites·14 claims
- 2042US12265327B2Semiconductor manufacturing apparatus and method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Apr 1, 2025·0 cites·20 claims
- 2139US9589820B2Semiconductor apparatus and adjustment methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Mar 7, 2017·0 cites·19 claims
- 2237US2005048208A1Resist supply apparatus with resist recycling function, coating system having the same and method of resist recyclingFiled 2003·Application pending·0 cites
- 2336US2005051196A1Developer dispensing apparatus with adjustable knife ringTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
- 2435US2005229976A1Adjustable rinse flow in semiconductor processingKAO YAO-HWAN·Filed 2004·Application pending·0 cites
- 2533US2004188547A1Developer dispensing nozzle with movable shutter platesTAIWAN SEMICONDUCTOR MFG·Filed 2003·Application pending·0 cites
- 2630US2005211267A1Rinse nozzle and methodKAO YAO-HWAN·Filed 2004·Application pending·0 cites
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