Inventor
SHIMAZU TOMOHISA
JP20 patents
Patents
20 patentsUS6235121B1May 22, 2001
Vertical thermal treatment apparatus
TOKYO ELECTRON LTD339 citations99
US5718574AFeb 17, 1998
Heat treatment apparatus
TOKYO ELECTRON LTD581 citations99
US6062853AMay 16, 2000
Heat-treating boat for semiconductor wafers
TOKYO ELECTRON LTD111 citations98
US5775889AJul 7, 1998
Heat treatment process for preventing slips in semiconductor wafers
TOKYO ELECTRON LTD395 citations98
US6142773ANov 7, 2000
Enveloping device and vertical heat-treating apparatus for semiconductor process system
TOKYO ELECTRON LTD34 citations92
US6030457AFeb 29, 2000
Substrate processing apparatus
TOKYO ELECTRON LTD42 citations92
US6031205AFeb 29, 2000
Thermal treatment apparatus with thermal protection members intercepting thermal radiation at or above a predetermined angle
TOKYO ELECTRON LTD22 citations92
USD411176SJun 22, 1999
Wafer boat for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD44 citations92
USD409158SMay 4, 1999
Wafer boat for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD36 citations92
USD407696SApr 6, 1999
Inner tube for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD35 citations92
USD405431SFeb 9, 1999
Tube for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD30 citations92
USD405062SFeb 2, 1999
Processing tube for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD32 citations92
USD404368SJan 19, 1999
Outer tube for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD24 citations92
USD404371SJan 19, 1999
Wafer boat for use in a semiconductor wafer heat processing apparatus
TOKYO ELECTRON LTD37 citations92
US5709543AJan 20, 1998
Vertical heat treatment apparatus
TOKYO ELECTRON LTD36 citations92
US6283175B1Sep 4, 2001
Enveloping device and vertical heat-treating apparatus for semiconductor process system
TOKYO ELECTRON LTD14 citations74
USD423026SApr 18, 2000
Quartz cover
TOKYO ELECTRON LTD14 citations74
USD404375SJan 19, 1999
Heat retaining tube base for use in a semiconductor wafer head processing apparatus
TOKYO ELECTRON LTD8 citations74
US7479619B2Jan 20, 2009
Thermal processing unit
TOKYO ELECTRON LTD4 citations62
US7144823B2Dec 5, 2006
Thermal treatment apparatus
TOKYO ELECTRON LTD2 citations62