Inventor · disambiguated record
John Rosato
Also filed as: ROSATO JOHN · ROSATO JOHN J
3 granted patents·8 pending applications·85 citations·filing 1999–2008
74Inventor score
Technology areasH10P
Top patents by PatentIndex Score
11 records- 0191US6726848B2Apparatus and method for single substrate processingSCP GLOBAL TECHNOLOGIES INC·Filed 2001·Granted Apr 27, 2004·56 cites·120 claims
- 0289US7694688B2Wet clean system designAPPLIED MATERIALS INC·Filed 2007·Granted Apr 13, 2010·20 cites·24 claims
- 0349US2007119544A1Apparatus and method for single substrate processing using megasonic-assisted dryingHANSEN ERIC·Filed 2006·Application pending·0 cites
- 0445US2008163890A1Tunable megasonics cavitation process using multiple transducers for cleaning nanometer particles without structure damageAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 0541US2009029560A1Apparatus and method for single substrate processingAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 0641US2004198051A1Apparatus and method for single substrate processingFiled 2004·Application pending·0 cites
- 0740US2008163900A1Ipa delivery system for dryingRICHARDS DOUGLAS·Filed 2007·Application pending·0 cites
- 0838US2007272657A1Apparatus and method for single substrate processingHANSEN ERIC·Filed 2006·Application pending·0 cites
- 0938US2006148267A1Apparatus and method for single-or double-substrate processingHANSEN ERIC·Filed 2002·Application pending·0 cites
- 1038US2008000495A1Apparatus and method for single substrate processingHANSEN ERIC·Filed 2006·Application pending·0 cites
- 1134US6878213B1Process and system for rinsing of semiconductor substratesSCP GLOBAL TECHNOLOGIES INC·Filed 1999·Granted Apr 12, 2005·9 cites·36 claims
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